SCHEMBL14452018

SCHEMBL14452018

CCN(CC)c1ccc(NC(=O)NS(=O)(=O)c2cc(OC)ccc2OC)c(OC)c1

nearest known ligand 0.55

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.55
GAA P10253 2/20 0.55
ALDH1A1 P00352 2/20 0.55
KDM4E B2RXH2 1/20 0.55
KMT2A Q03164 2/20 0.48
TAS1R3 Q7RTX0 1/20 0.48
TAS1R1 Q7RTX1 1/20 0.48
L3MBTL3 Q96JM7 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
HTT P42858 3/20 0.47
LMNA P02545 3/20 0.46
TP53 P04637 1/20 0.46
POLB P06746 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.45
HSD17B10 Q99714 1/20 0.45
MEN1 O00255 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14452015 0.93 MAPT (0.55) MAPTGAAALDH1A1KDM4EKMT2A
SCHEMBL14470193 0.91 GAA (0.47) MAPTGAAALDH1A1KDM4EKMT2A
SCHEMBL14452017 0.86 MAPT (0.48) MAPTGAAALDH1A1KDM4EKMT2A
SCHEMBL14514586 0.84 MAPT (0.48) MAPTGAAALDH1A1KDM4EKMT2A
SCHEMBL14452016 0.84 MAPT (0.46) MAPTGAAALDH1A1KDM4EL3MBTL3
SCHEMBL14470199 0.81 MAPT (0.46) MAPTGAAALDH1A1KDM4EKMT2A
SCHEMBL5960084 0.75 MAPT (0.54) MAPTGAAALDH1A1KDM4EKMT2A
SCHEMBL11073604 0.72 L3MBTL1 (0.52) MAPTGAAALDH1A1KDM4EKMT2A
SCHEMBL3928413 0.70 MAPT (0.61) MAPTGAAALDH1A1KMT2AL3MBTL1
SCHEMBL10828144 0.70 ALDH1A1 (0.52) MAPTGAAALDH1A1KMT2AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7250249-B2 Black and white photothermographic material FUJIFILM CORPORATION (JP) 2007-07-31 US disclosed
US-7247421-B2 Image forming method using photothermographic material FUJIFILM CORPORATION (JP) 2007-07-24 US disclosed