SCHEMBL1447749

SCHEMBL1447749

O=C(O)c1ccc(Sc2cccc(C(=O)O)c2)cc1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.66
CYP1A2 P05177 1/20 0.66
CYP2C9 P11712 1/20 0.66
HSD17B10 Q99714 1/20 0.66
APEX1 P27695 2/20 0.56
ALDH1A1 P00352 1/20 0.53
RARB P10826 1/20 0.51
RARG P13631 1/20 0.51
RXRA P19793 1/20 0.51
RXRB P28702 1/20 0.51
RXRG P48443 1/20 0.51
KDM4E B2RXH2 1/20 0.51
CA12 O43570 1/20 0.48
CA1 P00915 1/20 0.48
CA2 P00918 1/20 0.48
CA6 P23280 1/20 0.48
CA9 Q16790 1/20 0.48
TSHR P16473 2/20 0.48
DAO P14920 1/20 0.48
NAPRT Q6XQN6 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL7134403 0.98 HPGD (0.63) HPGDCYP1A2CYP2C9HSD17B10APEX1
SCHEMBL6778027 0.92 HPGD (0.70) HPGDCYP1A2CYP2C9HSD17B10APEX1
SCHEMBL2406839 0.92 CYP1A2 (0.76) HPGDCYP1A2CYP2C9HSD17B10APEX1
SCHEMBL31383422 0.92 CYP1A2 (0.76) HPGDCYP1A2CYP2C9HSD17B10APEX1
SCHEMBL14471210 0.89 HPGD (0.61) HPGDCYP1A2CYP2C9HSD17B10APEX1
SCHEMBL6759683 0.87 HPGD (0.59) HPGDCYP1A2CYP2C9HSD17B10APEX1
SCHEMBL1000649 0.87 HPGD (0.59) HPGDCYP1A2CYP2C9HSD17B10APEX1
SCHEMBL689927 0.86 HPGD (0.69) HPGDCYP1A2CYP2C9HSD17B10APEX1
SCHEMBL6934832 0.85 CA12 (0.55) HPGDCYP1A2CYP2C9HSD17B10APEX1
SCHEMBL9315801 0.85 CYP1A2 (0.85) HPGDCYP1A2CYP2C9HSD17B10APEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0856025-B1 CHOLESTERIC PHASE-FORMING POLYMERS AND THEIR USE CELANESE VENTURES GMBH (DE) 2003-01-15 EP claimed
EP-4516835-A1 SEMI-AROMATIC POLYESTER, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF Zhuhai Kingfa Biomaterial Co., Ltd. (CN) 2025-03-05 EP disclosed
CN-113527101-B Novel compound, polymer, process for producing the same, photosensitive resin composition, pattern forming process, cured film, and electronic component 信越化学工业株式会社 2024-04-23 CN disclosed
EP-3896114-B1 POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHINETSU CHEMICAL CO (JP) 2023-10-18 EP disclosed
WO-2023182071-A1 RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND DISPLAY DEVICE 東レ株式会社 2023-09-28 WO disclosed
US-11572442-B2 Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2023-02-07 US disclosed
CN-113527101-A Novel compound, polymer and method for producing same, photosensitive resin composition, method for forming pattern, cured film, and electronic component 信越化学工业株式会社 2021-10-22 CN disclosed
EP-3896114-A1 NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT Shin-Etsu Chemical Co., Ltd. (JP) 2021-10-20 EP disclosed
US-20210317270-A1 NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-14 US disclosed
EP-2716351-B1 GAS SEPARATION MEMBRANE CENTRAL GLASS CO LTD (JP) 2016-06-29 EP disclosed
EP-1557440-A1 Article formed of polybenzazole and production method for the same Polymatech Co., Ltd. (JP) 2005-07-27 EP disclosed
US-20050156356-A1 Article formed of polybenzazole and production method for the same POLYMATECH CO., LTD 2005-07-21 US disclosed
US-20040152862-A1 Optical resins and applications thereof HITACHI CHEMICAL CO., LTD. (JP) 2004-08-05 US disclosed
WO-2004058747-A1 FC RECEPTOR MODULATING COMPOUNDS AND COMPOSITIONS ARTHRON LIMITED (AU) 2004-07-15 WO disclosed
EP-1384743-A1 Polybenzazole precursor film, polybenzazole film and method of producing the same Polymatech Co., Ltd. (JP) 2004-01-28 EP disclosed
WO-2001087829-A1 BISACYLGUANIDINE MERCK PATENT GMBH (DE) 2001-11-22 WO disclosed
US-6107447-A LIQUID CRYSTALLINE POLYMERS HOECHST RESEARCH TECHNOLOGY DEUTCHLAND GMBH & CO. KG (DE) 2000-08-22 US disclosed
US-5534614-A Method for the preparation of amide oligomers and polybenzazole polymers therefrom THE DOW CHEMICAL COMPANY (US) 1996-07-09 US disclosed
US-5322916-A Method for the preparation of amide oligomers and polybenzazole polymers therefrom THE DOW CHEMICAL COMPANY (US) 1994-06-21 US disclosed
US-5138021-A High melting, anisotropic, excellent mechanical properties ATOCHEM (FR) 1992-08-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11572442-B2 Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component BRIX1, RBX1, HAX1 HPGD 4207/4885CYP1A2 3184/4885CYP2C9 2509/4885
US-20210317270-A1 NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT BRIX1, HAX1, RBX1 HPGD 4114/4885CYP1A2 3396/4885CYP2C9 2595/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.