SCHEMBL14487267

SCHEMBL14487267

C=C(CC(=O)CC)C(=O)OC1(CC)C2CC3CC(C2)CC1C3

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28401689 0.88 HSD11B1 (0.30)
SCHEMBL14272251 0.85 EPHX2 (0.31)
SCHEMBL713335 0.83 HSD11B1 (0.31)
SCHEMBL44041 0.80 ALDH1A1 (0.35)
SCHEMBL14523961 0.78 HSD11B1 (0.30)
SCHEMBL30421164 0.78 TSHR (0.35)
SCHEMBL14422354 0.76 HSD11B1 (0.35)
SCHEMBL17322697 0.76 HSD11B1 (0.36)
SCHEMBL19126193 0.76 CYP17A1 (0.30)
Methacrylic Acid SCHEMBL5857340 0.76 ALDH1A1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7232641-B2 Polymerizable compound, polymer, positive-resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-06-19 US disclosed
US-7232641-B2 Polymerizable compound, polymer, positive-resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-06-19 US disclosed