SCHEMBL17322697

SCHEMBL17322697

CCC1(OC(=O)C(=O)O)C2CC3CC(C2)CC1C3

nearest known ligand 0.39

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 10/20 0.36
CYP17A1 P05093 1/20 0.31
CYP19A1 P11511 1/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14422354 0.85 HSD11B1 (0.35) HSD11B1CYP17A1CYP19A1MEN1KMT2A
Methacrylic Acid SCHEMBL5857340 0.85 ALDH1A1 (0.33) HSD11B1ALDH1A1
SCHEMBL25509620 0.85 HSD11B1 (0.38) HSD11B1CYP17A1CYP19A1MEN1KMT2A
SCHEMBL44041 0.82 ALDH1A1 (0.35) HSD11B1CYP17A1CYP19A1ALDH1A1
SCHEMBL713335 0.82 HSD11B1 (0.31) HSD11B1CYP17A1CYP19A1
SCHEMBL439938 0.81 HSD11B1 (0.34) HSD11B1CYP17A1CYP19A1ALDH1A1
SCHEMBL28401689 0.81 HSD11B1 (0.30) HSD11B1
SCHEMBL30421164 0.81 TSHR (0.35) HSD11B1ALDH1A1
SCHEMBL14523961 0.81 HSD11B1 (0.30) HSD11B1
Methacrylic Acid SCHEMBL6298155 0.80 ALDH1A1 (0.42) HSD11B1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9529259-B2 Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound JSR CORPORATION (JP) 2016-12-27 US disclosed
US-9529259-B2 Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound JSR CORPORATION (JP) 2016-12-27 US disclosed
US-20150355539-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, COMPOUND, AND METHOD FOR PRODUCING COMPOUND JSR CORPORATION (JP) 2015-12-10 US disclosed
US-20150355539-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, COMPOUND, AND METHOD FOR PRODUCING COMPOUND JSR CORPORATION (JP) 2015-12-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150355539-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, COMPOUND, AND METHOD FOR PRODUCING COMPOUND RER1, MSR1, MRPS35 HSD11B1 3912/4885CYP17A1 3370/4885CYP19A1 3646/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.