SCHEMBL14543739

SCHEMBL14543739

O=C(OCCC1CCCCC1)c1ccc(S(=O)(=O)O)cc1Cl

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
SCN9A Q15858 5/20 0.41
ALDH1A1 P00352 2/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
HPGD P15428 2/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
CHRM2 P08172 2/20 0.39
CHRM4 P08173 2/20 0.39
CHRM5 P08912 2/20 0.39
CHRM1 P11229 2/20 0.39
CHRM3 P20309 2/20 0.39
THRB P10828 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6392866 0.90 CHRM2 (0.41) MEN1KMT2ASCN9AALDH1A1HPGD
SCHEMBL14543605 0.84 SCN9A (0.40) MEN1KMT2ASCN9AALDH1A1HPGD
SCHEMBL14543772 0.83 CA1 (0.43) MEN1KMT2ASCN9AALDH1A1HPGD
SCHEMBL14883067 0.81 NPC1 (0.52) SCN9AALDH1A1SMN1; SMN2HPGDNPC1
SCHEMBL6391684 0.80 ALDH1A1 (0.44) MEN1KMT2AALDH1A1CHRM2CHRM4
SCHEMBL6837846 0.78 SMN1; SMN2 (0.46) KMT2AALDH1A1SMN1; SMN2CHRM2CHRM4
SCHEMBL14543603 0.78 VCAM1 (0.40) MEN1KMT2ASCN9AALDH1A1HPGD
SCHEMBL178364 0.77 CHRM2 (0.40) KMT2ASCN9AALDH1A1SMN1; SMN2CHRM2
SCHEMBL14543737 0.77 KMT2A (0.44) KMT2ASCN9AALDH1A1HPGDCHRM2
SCHEMBL14543740 0.77 SCN9A (0.40) KMT2ASCN9AALDH1A1HPGDCHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8927194-B2 Chemical amplified photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-01-06 US disclosed
US-7205090-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-04-17 US disclosed
US-7175963-B2 Chemical amplification type positive resist composition and a resin therefor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-02-13 US disclosed