SCHEMBL14543772

SCHEMBL14543772

O=C(OCCC1CCCCC1)c1cc(S(=O)(=O)O)c(Cl)cc1Cl

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CA1 P00915 7/20 0.43
CA2 P00918 7/20 0.43
CA12 O43570 6/20 0.43
CA9 Q16790 5/20 0.43
CA3 P07451 4/20 0.43
CA6 P23280 4/20 0.43
CA5A P35218 4/20 0.43
CA7 P43166 4/20 0.43
CA13 Q8N1Q1 4/20 0.43
CA14 Q9ULX7 4/20 0.43
CA5B Q9Y2D0 4/20 0.43
CA4 P22748 3/20 0.43
SCN9A Q15858 7/20 0.42
ALDH1A1 P00352 2/20 0.40
MEN1 O00255 1/20 0.39
LMNA P02545 1/20 0.39
KMT2A Q03164 1/20 0.39
HPGD P15428 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14543739 0.83 MEN1 (0.41) SCN9AALDH1A1MEN1KMT2AHPGD
SCHEMBL14883127 0.82 SCN9A (0.41) CA1CA2SCN9AALDH1A1MEN1
SCHEMBL14543737 0.81 KMT2A (0.44) SCN9AALDH1A1LMNAKMT2AHPGD
SCHEMBL14543605 0.81 SCN9A (0.40) CA1CA2CA12CA9CA3
SCHEMBL6391140 0.80 CHRM2 (0.43) ALDH1A1KMT2A
SCHEMBL14543790 0.79 RAB9A (0.39) SCN9AALDH1A1MEN1LMNAKMT2A
SCHEMBL14543740 0.79 SCN9A (0.40) SCN9AALDH1A1KMT2AHPGD
SCHEMBL6392866 0.77 CHRM2 (0.41) SCN9AALDH1A1MEN1KMT2AHPGD
SCHEMBL6395603 0.77 SCN9A (0.36) SCN9A
SCHEMBL14543604 0.77 CHRM2 (0.39) ALDH1A1MEN1LMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8927194-B2 Chemical amplified photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-01-06 US disclosed
US-20070088131-A1 Sulfonate and resist composition TOISHI KOUJI 2007-04-19 US disclosed
US-7205090-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-04-17 US disclosed
US-7175963-B2 Chemical amplification type positive resist composition and a resin therefor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-02-13 US disclosed