SCHEMBL14543790

SCHEMBL14543790

O=C(OCCC1CCCCC1)c1c(Cl)ccc(S(=O)(=O)O)c1C(=O)OCCC1CCCCC1

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 2/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
SCN9A Q15858 5/20 0.37
CHRM2 P08172 2/20 0.37
CHRM4 P08173 2/20 0.37
CHRM5 P08912 2/20 0.37
CHRM1 P11229 2/20 0.37
CHRM3 P20309 2/20 0.37
HPGD P15428 1/20 0.36
NPC1 O15118 1/20 0.36
ALDH1A1 P00352 2/20 0.35
TDP1 Q9NUW8 1/20 0.35
LMNA P02545 1/20 0.34
GPR119 Q8TDV5 1/20 0.33
P2RX7 Q99572 1/20 0.33
PTGS2 P35354 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14543737 0.83 KMT2A (0.44) KMT2ASCN9ACHRM2CHRM4CHRM5
SCHEMBL14543606 0.82 THRB (0.43) MEN1KMT2ACHRM2CHRM4CHRM5
SCHEMBL14883132 0.81 MEN1 (0.41) RAB9AMEN1KMT2ASCN9ACHRM2
SCHEMBL14543604 0.81 CHRM2 (0.39) RAB9AMEN1KMT2ACHRM2CHRM4
SCHEMBL14543605 0.80 SCN9A (0.40) RAB9AMEN1KMT2ASCN9ACHRM2
SCHEMBL14543772 0.79 CA1 (0.43) MEN1KMT2ASCN9AHPGDALDH1A1
SCHEMBL6391140 0.76 CHRM2 (0.43) KMT2ACHRM2CHRM4CHRM5CHRM1
SCHEMBL12406579 0.75 RAB9A (0.37) RAB9AMEN1KMT2ASCN9ACHRM2
SCHEMBL14543740 0.75 SCN9A (0.40) KMT2ASCN9ACHRM2CHRM4CHRM5
SCHEMBL14543736 0.75 HTR7 (0.43) MEN1KMT2ACHRM2CHRM4CHRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8927194-B2 Chemical amplified photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-01-06 US disclosed
US-20070088131-A1 Sulfonate and resist composition TOISHI KOUJI 2007-04-19 US disclosed
US-7205090-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-04-17 US disclosed