Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGAT1 | O75907 | 1/20 | 0.34 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.30 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4214456 | 0.81 | DGAT1 (0.36) | DGAT1 | |
| SCHEMBL24515275 | 0.81 | CHRM2 (0.38) | DGAT1 | |
| SCHEMBL29046563 | 0.81 | CHRM2 (0.38) | DGAT1 | |
| SCHEMBL24515824 | 0.81 | CHRM2 (0.38) | DGAT1 | |
| SCHEMBL24515274 | 0.80 | DGAT1 (0.32) | DGAT1MAPK1 | |
| SCHEMBL9908331 | 0.80 | NPSR1 (0.44) | DGAT1RIPK1TSHRMAPK1CYP4F2 | |
| Hydrochloric Acid SCHEMBL27952604 | 0.78 | NPSR1 (0.42) | DGAT1RIPK1TSHRMAPK1CYP4F2 | |
| SCHEMBL9908329 | 0.78 | NPSR1 (0.45) | DGAT1RIPK1CYP4F2CYP4A11 | |
| SCHEMBL14557006 | 0.76 | ALDH1A1 (0.36) | MAPK1 | |
| SCHEMBL30659863 | 0.76 | DGAT1 (0.34) | DGAT1CYP4F2CYP4A11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7195856-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-03-27 | — | — | US | disclosed |
| US-7195856-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-03-27 | — | — | US | disclosed |
| US-7157206-B2 | Resin containing an acid-decomposable group such as bis(trifluoromethyl)methanol group, to generate alkali-soluble group, and acid generators selected from fluorine-substituted or non-fluorine substituted aromatic or aliphatic carboxylic acid generators or sulfonic acid generators; microlithography | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157206-B2 | Resin containing an acid-decomposable group such as bis(trifluoromethyl)methanol group, to generate alkali-soluble group, and acid generators selected from fluorine-substituted or non-fluorine substituted aromatic or aliphatic carboxylic acid generators or sulfonic acid generators; microlithography | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |