Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.32 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26939802 | 0.77 | ALDH1A1 (0.35) | ALDH1A1L3MBTL1CYP17A1CYP19A1MEN1 | |
| SCHEMBL14557008 | 0.76 | DGAT1 (0.34) | MAPK1 | |
| SCHEMBL20962055 | 0.73 | MEN1 (0.36) | ALDH1A1CYP17A1CYP19A1MEN1MAPK1 | |
| SCHEMBL14838346 | 0.73 | MEN1 (0.38) | ALDH1A1CYP17A1CYP19A1MEN1MAPK1 | |
| SCHEMBL12009282 | 0.71 | ALDH1A1 (0.32) | ALDH1A1CYP17A1CYP19A1 | |
| SCHEMBL3290691 | 0.71 | MEN1 (0.39) | ALDH1A1CYP17A1CYP19A1MEN1MAPK1 | |
| SCHEMBL441785 | 0.71 | MEN1 (0.39) | CYP17A1CYP19A1MEN1MAPK1KMT2A | |
| SCHEMBL12149823 | 0.70 | KMT2A (0.35) | ALDH1A1CYP17A1CYP19A1MEN1MAPK1 | |
| SCHEMBL13638396 | 0.70 | MEN1 (0.38) | ALDH1A1CYP17A1CYP19A1MEN1MAPK1 | |
| SCHEMBL4903544 | 0.70 | EPHX2 (0.39) | ALDH1A1L3MBTL1CYP17A1CYP19A1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7195856-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-03-27 | — | — | US | disclosed |
| US-7157206-B2 | Resin containing an acid-decomposable group such as bis(trifluoromethyl)methanol group, to generate alkali-soluble group, and acid generators selected from fluorine-substituted or non-fluorine substituted aromatic or aliphatic carboxylic acid generators or sulfonic acid generators; microlithography | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |