SCHEMBL1457230

SCHEMBL1457230

Oc1ccc(-c2c(-c3ccc(O)cc3)c(-c3ccc(O)cc3)c(-c3ccc(O)cc3)c(-c3ccc(O)cc3)c2-c2ccc(O)cc2)cc1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 9/20 0.71
ESR2 Q92731 6/20 0.71
MEN1 O00255 3/20 0.61
KMT2A Q03164 3/20 0.61
NPC1 O15118 2/20 0.61
MAPT P10636 2/20 0.61
NFKB1 P19838 2/20 0.61
RAB9A P51151 2/20 0.61
KDM4E B2RXH2 1/20 0.61
CA12 O43570 1/20 0.61
GMNN O75496 1/20 0.61
ALDH1A1 P00352 1/20 0.61
CA1 P00915 1/20 0.61
CA2 P00918 1/20 0.61
LMNA P02545 1/20 0.61
CA3 P07451 1/20 0.61
CYP3A4 P08684 1/20 0.61
TYR P14679 1/20 0.61
HPGD P15428 1/20 0.61
ALOX15 P16050 1/20 0.61

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22147379 0.87 MMP3 (0.78) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL20323048 0.87 MMP3 (0.78) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL22147351 0.87 MMP3 (0.78) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL20323157 0.87 MMP3 (0.78) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL28979295 0.87 MMP3 (0.78) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL21667783 0.85 MMP3 (0.83) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL21667678 0.85 MMP3 (0.74) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL16420022 0.85 MMP3 (0.83) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL1598486 0.85 SENP1 (0.76) ESR1ESR2MEN1KMT2ANPC1
SCHEMBL20323043 0.85 MMP3 (0.83) ESR1ESR2MEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113736036-B Multi-arm polycarboxylate superplasticizer and preparation method thereof 成都奥莱特时代新材料有限公司 2022-06-10 CN claimed
CN-113736036-A Multi-arm polycarboxylate superplasticizer and preparation method thereof 成都奥莱特时代新材料有限公司 2021-12-03 CN claimed
EP-3558917-B1 NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME MERCK PATENT GMBH (DE) 2024-01-24 EP disclosed
CN-113736036-B Multi-arm polycarboxylate superplasticizer and preparation method thereof 成都奥莱特时代新材料有限公司 2022-06-10 CN disclosed
CN-113736036-A Multi-arm polycarboxylate superplasticizer and preparation method thereof 成都奥莱特时代新材料有限公司 2021-12-03 CN disclosed
US-20200044158-A1 NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME MERCK PATENT GMBH (DE) 2020-02-06 US disclosed
WO-2018115043-A1 NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME MERCK PATENT GMBH (DE) 2018-06-28 WO disclosed
US-9152043-B2 Negative tone molecular glass resists and methods of making and using same GEORGIA TECH RESEARCH CORPORATION (US) 2015-10-06 US disclosed
US-8841059-B2 Crosslinking agent, negative resist composition, and pattern forming method using the negative resist composition DAI NIPPON PRINTING CO., LTD. (JP) 2014-09-23 US disclosed
US-8841059-B2 Crosslinking agent, negative resist composition, and pattern forming method using the negative resist composition DAI NIPPON PRINTING CO., LTD. (JP) 2014-09-23 US disclosed
US-20120115084-A1 CROSSLINKING AGENT, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING METHOD USING THE NEGATIVE RESIST COMPOSITION DAI NIPPON PRINTING CO., LTD. (JP) 2012-05-10 US disclosed
US-20120115084-A1 CROSSLINKING AGENT, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING METHOD USING THE NEGATIVE RESIST COMPOSITION DAI NIPPON PRINTING CO., LTD. (JP) 2012-05-10 US disclosed
US-20110097668-A1 NEGATIVE TONE MOLECULAR GLASS RESISTS AND METHODS OF MAKING AND USING SAME GEORGIA TECH RESEARCH CORPORATION (US) 2011-04-28 US disclosed
EP-2297608-A2 NEGATIVE TONE MOLECULAR GLASS RESISTS AND METHODS OF MAKING AND USING SAME Georgia Tech Research Corporation (US) 2011-03-23 EP disclosed
WO-2009143482-A2 NEGATIVE TONE MOLECULAR GLASS RESISTS AND METHODS OF MAKING AND USING SAME GEORGIA TECH RESEARCH CORPORATION (US) 2009-11-26 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120115084-A1 CROSSLINKING AGENT, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING METHOD USING THE NEGATIVE RESIST COMPOSITION SEM1, ELL, POLL ESR1 267/4885ESR2 61/4885MEN1 4347/4885
US-20200044158-A1 NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME TYR, TRPA1, CD99 ESR1 935/4885ESR2 1497/4885MEN1 2434/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.