SCHEMBL14588682

SCHEMBL14588682

CC(=O)N(OCc1ccccc1)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.52
ALOX5 P09917 1/20 0.45
PTGS1 P23219 1/20 0.45
PTGS2 P35354 1/20 0.45
MAPT P10636 1/20 0.44
HPGD P15428 1/20 0.44
CRHBP P24387 1/20 0.44
CRHR2 Q13324 1/20 0.44
MAOB P27338 2/20 0.44
HCAR2 Q8TDS4 1/20 0.42
TSPO P30536 2/20 0.42
MAPK1 P28482 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
SLC6A2 P23975 1/20 0.42
SLC6A3 Q01959 1/20 0.42
KMT2A Q03164 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
EPHX2 P34913 1/20 0.41
BRD4 O60885 1/20 0.41
LMNA P02545 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8779724 0.85 ALDH1A1 (0.46) ALDH1A1ALOX5PTGS1PTGS2MAPT
SCHEMBL7667460 0.82 ALDH1A1 (0.47) ALDH1A1ALOX5MAPTHPGDHCAR2
SCHEMBL13603966 0.81 ALDH1A1 (0.46) ALDH1A1CRHBPCRHR2L3MBTL1KMT2A
SCHEMBL13479771 0.81 TP53 (0.54) ALDH1A1ALOX5MAPTHPGDMAPK1
SCHEMBL13479774 0.81 KMT2A (0.49) ALDH1A1ALOX5MAPTHPGDL3MBTL1
SCHEMBL10689973 0.81 PTGER1 (0.43) ALDH1A1HPGDCRHBPCRHR2
SCHEMBL27678665 0.80 ALDH1A1 (0.49) ALDH1A1MAPTHPGDMAPK1L3MBTL1
SCHEMBL18051150 0.79 L3MBTL1 (0.54) ALDH1A1MAPTHPGDL3MBTL1KMT2A
SCHEMBL8469795 0.79 LMNA (0.44) ALDH1A1CRHBPCRHR2L3MBTL1KMT2A
SCHEMBL7045980 0.78 ALDH1A1 (0.55) ALDH1A1ALOX5PTGS1PTGS2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7157205-B2 Intermediate layer composition for multilayer resist process, pattern-forming process using the same, and laminate FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 US disclosed