SCHEMBL14601992

SCHEMBL14601992

C=COC1C2OC3C(COC31)C2COC(C)=O

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
NLRP3 Q96P20 1/20 0.31
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14602014 0.86 NR3C1 (0.31) ALDH1A1
SCHEMBL14601967 0.82
SCHEMBL14601974 0.81 ALDH1A1 (0.41) ALDH1A1
SCHEMBL14602013 0.80 NLRP3 (0.31) NLRP3ALDH1A1
SCHEMBL14602038 0.79 ALDH1A1 (0.32) ALDH1A1
SCHEMBL14602023 0.73
SCHEMBL14602104 0.71 ALDH1A1 (0.34) ALDH1A1
SCHEMBL14602075 0.69 ALDH1A1 (0.39) ALDH1A1
SCHEMBL14602022 0.69
SCHEMBL14601975 0.68 ALDH1A1 (0.38) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7169541-B2 Compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 US disclosed
US-7169541-B2 Compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 US disclosed