SCHEMBL14616452

SCHEMBL14616452

Oc1ccc(C(c2ccc(O)c(C3CCCCC3)c2)C(c2ccc(O)c(C3CCCCC3)c2)c2ccc(O)c(C3CCCCC3)c2)cc1C1CCCCC1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NUDT1 P36639 1/20 0.53
BACE1 P56817 1/20 0.53
HSP90AA1 P07900 1/20 0.53
ACMSD Q8TDX5 2/20 0.44
THRB P10828 2/20 0.39
HIF1A Q16665 1/20 0.38
HSD17B10 Q99714 1/20 0.38
HDAC4 P56524 1/20 0.35
HDAC2 Q92769 1/20 0.35
HDAC8 Q9BY41 1/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
KDM4E B2RXH2 1/20 0.35
MAPT P10636 1/20 0.35
ADRB2 P07550 1/20 0.34
PTGDR2 Q9Y5Y4 4/20 0.33
PTGDR Q13258 2/20 0.33
FEN1 P39748 1/20 0.33
THRA P10827 1/20 0.32
SERPINE1 P05121 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27693053 0.87 NUDT1 (0.51) NUDT1BACE1HSP90AA1ACMSDTHRB
SCHEMBL11877058 0.86 NUDT1 (0.50) NUDT1BACE1HSP90AA1ACMSDTHRB
SCHEMBL10595673 0.86 HSP90AA1 (0.54) NUDT1BACE1HSP90AA1ACMSDTHRB
SCHEMBL2201799 0.84 NUDT1 (0.49) NUDT1BACE1HSP90AA1ACMSDTHRB
SCHEMBL3178564 0.84 NUDT1 (0.53) NUDT1BACE1HSP90AA1ACMSDTHRB
SCHEMBL10347780 0.83 NUDT1 (0.51) NUDT1BACE1HSP90AA1ACMSDTHRB
SCHEMBL761682 0.83 NUDT1 (0.48) NUDT1BACE1HSP90AA1ACMSDTHRB
SCHEMBL29375732 0.83 NUDT1 (0.48) NUDT1BACE1HSP90AA1ACMSDTHRB
SCHEMBL4061776 0.82 NUDT1 (0.50) NUDT1BACE1HSP90AA1ACMSDTHRB
SCHEMBL2861169 0.82 NUDT1 (0.47) NUDT1BACE1HSP90AA1ACMSDTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9798234-B2 Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask FUJIFILM CORPORATION (JP) 2017-10-24 US disclosed
US-9798234-B2 Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask FUJIFILM CORPORATION (JP) 2017-10-24 US disclosed
US-9651864-B2 Negative resist composition, method for producing relief pattern using the same, and electronic component using the same DAI NIPPON PRINTING CO., LTD. (JP) 2017-05-16 US disclosed
US-9651864-B2 Negative resist composition, method for producing relief pattern using the same, and electronic component using the same DAI NIPPON PRINTING CO., LTD. (JP) 2017-05-16 US disclosed
US-20160327862-A1 RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD, AND PHOTO MASK FUJIFILM CORPORATION (JP) 2016-11-10 US disclosed
US-20160327862-A1 RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD, AND PHOTO MASK FUJIFILM CORPORATION (JP) 2016-11-10 US disclosed
US-20130017376-A1 NEGATIVE RESIST COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING THE SAME, AND ELECTRONIC COMPONENT USING THE SAME DAI NIPPON PRINTING CO., LTD. (JP) 2013-01-17 US disclosed
US-20130017376-A1 NEGATIVE RESIST COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING THE SAME, AND ELECTRONIC COMPONENT USING THE SAME DAI NIPPON PRINTING CO., LTD. (JP) 2013-01-17 US disclosed