SCHEMBL14620100

SCHEMBL14620100

O=c1c2ccccc2nnn1OS(=O)(=O)c1cccc2ccccc12

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.50
MAPT P10636 2/20 0.50
NPC1 O15118 2/20 0.50
RAB9A P51151 2/20 0.50
HTT P42858 1/20 0.50
PKM P14618 1/20 0.43
KMT2A Q03164 3/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
CYP1A2 P05177 1/20 0.40
CYP2C19 P33261 1/20 0.40
HPGD P15428 1/20 0.40
MEN1 O00255 2/20 0.40
GAA P10253 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA9 Q16790 1/20 0.40
GPR139 Q6DWJ6 1/20 0.38
LMNA P02545 1/20 0.38
PTBP1 P26599 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28860543 0.85 HTT (0.61) ALDH1A1MAPTNPC1RAB9AHTT
SCHEMBL11450683 0.81 ALDH1A1 (0.45) ALDH1A1MAPTNPC1RAB9AKMT2A
SCHEMBL4012048 0.77 ALDH1A1 (0.50) ALDH1A1MAPTNPC1RAB9AHTT
SCHEMBL14620595 0.75 ALDH1A1 (0.52) ALDH1A1MAPTNPC1RAB9AHTT
SCHEMBL14620099 0.74 KMT2A (0.51) ALDH1A1KMT2ASMN1; SMN2CYP1A2CYP2C19
SCHEMBL19136734 0.73 HTT (0.45) ALDH1A1MAPTNPC1RAB9AHTT
SCHEMBL24437289 0.70 ALDH1A1 (0.51) ALDH1A1MAPTNPC1RAB9AHTT
SCHEMBL757021 0.70 ALDH1A1 (0.56) ALDH1A1MAPTNPC1RAB9AHTT
SCHEMBL14620598 0.70 ALDH1A1 (0.50) ALDH1A1MAPTNPC1RAB9AKMT2A
SCHEMBL5367849 0.70 CA1 (0.47) ALDH1A1MAPTHTTKMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7157205-B2 Intermediate layer composition for multilayer resist process, pattern-forming process using the same, and laminate FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 US disclosed