SCHEMBL14620099

SCHEMBL14620099

COc1ccc(S(=O)(=O)On2nnc3ccccc3c2=O)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 1/20 0.51
HPGD P15428 1/20 0.50
GPR139 Q6DWJ6 5/20 0.49
TSHR P16473 2/20 0.45
ALDH1A1 P00352 4/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
CYP1A2 P05177 1/20 0.43
POLB P06746 1/20 0.43
CYP2C9 P11712 1/20 0.43
CYP2C19 P33261 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
TUBB4A P04350 1/20 0.43
TUBB P07437 1/20 0.43
TUBA3C P0DPH7 1/20 0.43
TUBA1B P68363 1/20 0.43
TUBA4A P68366 1/20 0.43
TUBB4B P68371 1/20 0.43
TUBB3 Q13509 1/20 0.43
TUBB2A Q13885 1/20 0.43
TUBB8 Q3ZCM7 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11450683 0.87 ALDH1A1 (0.45) KMT2AHPGDALDH1A1SMN1; SMN2CYP1A2
SCHEMBL4012048 0.78 ALDH1A1 (0.50) KMT2AHPGDTSHRALDH1A1SMN1; SMN2
SCHEMBL14620595 0.76 ALDH1A1 (0.52) KMT2AHPGDTSHRALDH1A1SMN1; SMN2
SCHEMBL757021 0.75 ALDH1A1 (0.56) KMT2AHPGDTSHRALDH1A1SMN1; SMN2
SCHEMBL14620100 0.74 ALDH1A1 (0.50) KMT2AHPGDGPR139ALDH1A1SMN1; SMN2
SCHEMBL28981300 0.73 RAB9A (0.67) KMT2AHPGDGPR139ALDH1A1SMN1; SMN2
SCHEMBL14620230 0.72 CYP1A2 (0.61) KMT2AHPGDTSHRALDH1A1CYP1A2
SCHEMBL14620598 0.71 ALDH1A1 (0.50) KMT2AHPGDTSHRALDH1A1SMN1; SMN2
SCHEMBL2801877 0.69 SLC9A1 (0.59) KMT2AHPGDTSHRALDH1A1SMN1; SMN2
SCHEMBL14620607 0.69 MEN1 (0.59) KMT2AHPGDALDH1A1SMN1; SMN2POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7157205-B2 Intermediate layer composition for multilayer resist process, pattern-forming process using the same, and laminate FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 US disclosed