SCHEMBL14667608

SCHEMBL14667608

Cc1ccccc1CC(C)OC1CCCC1

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ ACHE P22303 1/20 0.38
▸ SLC6A4 P31645 3/20 0.38
▸ SLC6A2 P23975 2/20 0.38
▸ SIGMAR1 Q99720 1/20 0.38
▸ EPHX2 P34913 1/20 0.38
▸ SLC6A3 Q01959 1/20 0.38
▸ DPP4 P27487 1/20 0.37
▸ FAP Q12884 1/20 0.37
▸ DPP8 Q6V1X1 1/20 0.37
▸ DPP9 Q86TI2 1/20 0.37
▸ HPGD P15428 1/20 0.37
▸ TACR1 P25103 2/20 0.36
▸ HTR2A P28223 1/20 0.36
▸ HTR2C P28335 1/20 0.36
▸ GBA1 P04062 1/20 0.35
▸ TAAR1 Q96RJ0 1/20 0.35
▸ LMNA P02545 1/20 0.35
▸ CYP1A2 P05177 1/20 0.35
▸ CYP2D6 P10635 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1836850 0.82 HRH3 (0.39) SLC6A4SLC6A2SLC6A3LMNACYP1A2
SCHEMBL14667587 0.81 PDE4A (0.46) SLC6A4SLC6A2SIGMAR1SLC6A3HTR2A
SCHEMBL1838160 0.81 LMNA (0.39) SLC6A4SLC6A2SLC6A3LMNACYP1A2
SCHEMBL1840784 0.81 LMNA (0.39) SLC6A4SLC6A2SLC6A3LMNACYP1A2
SCHEMBL1836994 0.81 LMNA (0.39) SLC6A4SLC6A2SLC6A3LMNACYP1A2
SCHEMBL14667605 0.80 SLC18A2 (0.47) ACHESIGMAR1CYP1A2CYP2D6
SCHEMBL2702521 0.79 PDE4A (0.45) SLC6A4SLC6A2SIGMAR1SLC6A3HTR2A
SCHEMBL22361192 0.76 TAAR1 (0.43) ACHESLC6A4SLC6A2SLC6A3TAAR1
SCHEMBL1837849 0.75 GABRA1 (0.35) HTR2AHTR2CLMNACYP1A2CYP2D6
SCHEMBL9729257 0.74 TAAR1 (0.42) ACHESLC6A4SLC6A2SLC6A3TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8673538-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-03-18 — — US disclosed
US-8673538-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-03-18 — — US disclosed
US-20130029255-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-31 — — US disclosed
US-20130029255-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-31 — — US disclosed
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