Methacrylic Acid

Methacrylic Acid

SCHEMBL14675436

C=C(C)C(=O)O.CC[N+](C)(C)C.O=S(=O)([O-])O

nearest known ligand 0.32

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Known targets — ChEMBL curated mechanism

CYP51cyp51Acyp51c

The experimentally established mechanism targets of Methacrylic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.32
ALDH1A1 P00352 2/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
BBOX1 O75936 2/20 0.31
CYP2C19 P33261 1/20 0.30
LMNA P02545 1/20 0.30
APEX1 P27695 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL14675435 0.94 BBOX1 (0.32) TSHRALDH1A1BBOX1CYP2C19LMNA
Methacrylic Acid SCHEMBL9636345 0.91 TSHR (0.33) TSHRALDH1A1CYP2C19LMNAAPEX1
Methacrylic Acid SCHEMBL1713812 0.87 TSHR (0.39) TSHRALDH1A1CYP2C19LMNAAPEX1
Methacrylic Acid SCHEMBL1874883 0.86 POLB (0.33) ALDH1A1
Methacrylic Acid SCHEMBL2059649 0.84 ALDH1A1 (0.42) TSHRALDH1A1CYP2C19LMNAAPEX1
Methacrylic Acid SCHEMBL20917781 0.84 TSHR (0.38) TSHRALDH1A1CYP2C19LMNAAPEX1
Methacrylic Acid SCHEMBL28949884 0.82 ALDH1A1 (0.50) TSHRALDH1A1MEN1KMT2A
Sulfuric Acid SCHEMBL3467201 0.82 TSHR (0.47) TSHRALDH1A1MEN1KMT2ABBOX1
Sulfuric Acid Dimethyl Ester SCHEMBL27628757 0.80 ALDH1A1 (0.32) ALDH1A1LMNA
Sulfuric Acid SCHEMBL28984262 0.79 MEN1 (0.44) TSHRALDH1A1MEN1KMT2ABBOX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013018356-A1 METHOD FOR PRODUCING COMPOSITE PARTICLE, METHOD FOR PRODUCING COSMETIC, AND COSMETIC SHIN-ETSU CHEMICAL CO.,LTD. (JP) 2013-02-07 WO disclosed