SCHEMBL14680960

SCHEMBL14680960

COS(=O)(=O)C(F)(F)COC(=O)C1CC2CCC1C2

nearest known ligand 0.37

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.37
EPHX2 P34913 1/20 0.35
HSD11B1 P28845 1/20 0.35
TSHR P16473 1/20 0.32
HPGD P15428 2/20 0.32
SLC6A3 Q01959 2/20 0.32
L3MBTL1 Q9Y468 2/20 0.32
NPC1 O15118 1/20 0.32
ALDH1A1 P00352 1/20 0.32
MAPT P10636 1/20 0.32
MAPK1 P28482 1/20 0.32
RAB9A P51151 1/20 0.32
GFER P55789 1/20 0.32
KCNQ3 O43525 1/20 0.31
KCNQ2 O43526 1/20 0.31
KCNQ4 P56696 1/20 0.31
KCNQ5 Q9NR82 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13080639 0.86 EPHX2 (0.39) POLBEPHX2HSD11B1HPGDSLC6A3
SCHEMBL10134892 0.85 POLB (0.40) POLBEPHX2HSD11B1HPGDL3MBTL1
SCHEMBL3454543 0.84 POLB (0.39) POLBEPHX2HSD11B1HPGDL3MBTL1
SCHEMBL9908343 0.78 POLB (0.41) POLBEPHX2HSD11B1TSHRHPGD
SCHEMBL17070168 0.78 POLB (0.41) POLBEPHX2HSD11B1TSHRHPGD
SCHEMBL19036857 0.77 POLB (0.32) POLB
SCHEMBL26190677 0.77 POLB (0.35) POLBHSD11B1TSHRSLC6A3L3MBTL1
SCHEMBL12912754 0.77 POLB (0.35) POLBEPHX2HSD11B1
SCHEMBL21853767 0.77 POLB (0.47) POLBEPHX2HSD11B1TSHRHPGD
SCHEMBL13923785 0.76 POLB (0.41) POLBEPHX2HSD11B1HPGDL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11747725-B2 Radiation-sensitive resin composition and method for forming resist pattern JSR CORPORATION (JP) 2023-09-05 US disclosed
US-8853441-B2 Sulfonium compound, photoacid generator, and resist composition KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2014-10-07 US disclosed
US-20130035503-A1 SULFONIUM COMPOUND, PHOTOACID GENERATOR, AND RESIST COMPOSITION KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2013-02-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11747725-B2 Radiation-sensitive resin composition and method for forming resist pattern RER1, AFF1, RAD51 POLB 767/4885EPHX2 430/4885HSD11B1 1823/4885
US-20130035503-A1 SULFONIUM COMPOUND, PHOTOACID GENERATOR, AND RESIST COMPOSITION SRP54, SRSF1, SRSF7 POLB 1382/4885EPHX2 3668/4885HSD11B1 2238/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.