SCHEMBL14700415

SCHEMBL14700415

CC(F)(F)C(=O)OC1C2CC3CC1CC(C(=O)OCC(O)COC(=O)C14CC5CC(CC(O)(C5)C1)C4)(C3)C2

nearest known ligand 0.42

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.42
PKM P14618 1/20 0.40
L3MBTL1 Q9Y468 2/20 0.38
PRKCA P17252 1/20 0.37
ABL1 P00519 1/20 0.37
TSHR P16473 1/20 0.37
RIN1 Q13671 1/20 0.37
NPSR1 Q6W5P4 2/20 0.36
LMNA P02545 1/20 0.36
NPC1 O15118 4/20 0.35
RAB9A P51151 4/20 0.35
USP2 O75604 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
POLB P06746 1/20 0.33
GAA P10253 1/20 0.33
HSD11B1 P28845 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14700412 0.92 PKM (0.46) ALDH1A1PKMPRKCANPSR1HSD11B1
SCHEMBL14727755 0.90 PRKCA (0.47) ALDH1A1PKML3MBTL1PRKCAABL1
SCHEMBL14701487 0.88 PKM (0.41) ALDH1A1PKML3MBTL1PRKCAABL1
SCHEMBL14700404 0.87 PKM (0.41) ALDH1A1PKMPRKCANPSR1HSD11B1
SCHEMBL14700557 0.87 PKM (0.37) PKMPRKCAHSD11B1
SCHEMBL14700414 0.86 ALDH1A1 (0.46) ALDH1A1PKML3MBTL1PRKCAABL1
SCHEMBL14700531 0.86 PRKCA (0.43) ALDH1A1PKMPRKCANPSR1HSD11B1
SCHEMBL11959242 0.84 ALDH1A1 (0.39) ALDH1A1L3MBTL1ABL1TSHRRIN1
SCHEMBL14700411 0.83 PKM (0.39) ALDH1A1PKMPRKCATSHRNPSR1
SCHEMBL14700427 0.82 PKM (0.42) PKMPRKCAHSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8802352-B2 Salt, photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-08-12 US disclosed
US-20130040239-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-02-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130040239-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN CRY1, H1-0, SPIN1 ALDH1A1 1898/4885PKM 3615/4885L3MBTL1 1569/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.