SCHEMBL14713746

SCHEMBL14713746

CCC1(OC(=O)c2ccc(C(C)(C)CC)cc2)CCCC1

nearest known ligand 0.40

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 2/20 0.39
NPC1 O15118 2/20 0.39
RAB9A P51151 2/20 0.39
POLB P06746 1/20 0.39
HRH3 Q9Y5N1 10/20 0.37
MAOB P27338 1/20 0.37
ADORA3 P0DMS8 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CNR2 P34972 2/20 0.35
MEN1 O00255 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C19 P33261 1/20 0.35
KMT2A Q03164 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
MAPT P10636 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25780250 0.86 SMN1; SMN2 (0.35) CYP2C9NPC1RAB9AADORA3TDP1
SCHEMBL7196430 0.85 SMN1; SMN2 (0.41) CYP2C9NPC1RAB9AADORA3TDP1
SCHEMBL23817403 0.84 CES2 (0.42) MAOBMEN1CYP1A2CYP3A4CYP2C19
SCHEMBL29319752 0.84 MAOB (0.40) CYP2C9NPC1RAB9APOLBHRH3
SCHEMBL13242081 0.84 HSD11B1 (0.33) CYP2C9ADORA3TDP1MEN1CYP1A2
SCHEMBL23817401 0.83 TSHR (0.42) MAOBMEN1CYP1A2CYP3A4CYP2C19
SCHEMBL26226728 0.80 NPC1 (0.36) CYP2C9NPC1RAB9APOLBHRH3
SCHEMBL25468040 0.80 HRH3 (0.37) CYP2C9NPC1RAB9APOLBHRH3
SCHEMBL14838280 0.80 ADORA3 (0.36) CYP2C9NPC1RAB9APOLBADORA3
SCHEMBL24306003 0.80 TDP1 (0.44) CYP2C9NPC1RAB9APOLBTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130045445-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-02-21 US disclosed