SCHEMBL14727760

SCHEMBL14727760

CC(F)(F)COC(=O)C(C)(COC(=O)C12CC3CC(C1)C(O)C(C3)C2)COC(=O)C12CC3CC(C1)C(O)C(C3)C2

nearest known ligand 0.36

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.34
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
NPSR1 Q6W5P4 2/20 0.34
MAPT P10636 1/20 0.34
PRKCA P17252 1/20 0.33
ATM Q13315 1/20 0.32
CYP17A1 P05093 3/20 0.32
CYP19A1 P11511 3/20 0.32
PKM P14618 1/20 0.30
HSD11B1 P28845 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL686175 0.92 ALDH1A1 (0.38) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL14727765 0.88 PRKCA (0.34) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL14731097 0.88 ALDH1A1 (0.31) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL14727756 0.82 NPSR1 (0.34) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL18232664 0.82 ALDH1A1 (0.40) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL2601744 0.81 ALDH1A1 (0.47) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL14727757 0.78 ALDH1A1 (0.47) ALDH1A1NPSR1HSD11B1
SCHEMBL17425999 0.77 ALDH1A1 (0.33) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL15853229 0.77 ALDH1A1 (0.37) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL785727 0.76 ALDH1A1 (0.36) ALDH1A1MEN1KMT2ANPSR1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8741544-B2 Salt, photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-06-03 US disclosed
US-20130052588-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-02-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130052588-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN RER1, COL1A1, H1-0 ALDH1A1 1936/4885MEN1 3252/4885KMT2A 1351/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.