Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 5/20 | 0.34 |
| ▸ | ESR2 | Q92731 | 5/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | ELANE | P08246 | 3/20 | 0.33 |
| ▸ | GAA | P10253 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | CNR1 | P21554 | 1/20 | 0.30 |
| ▸ | CNR2 | P34972 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12014441 | 0.81 | ADRB2 (0.31) | — | |
| SCHEMBL10064125 | 0.79 | ESR1 (0.39) | ESR1ESR2KMT2AMEN1ELANE | |
| SCHEMBL13408039 | 0.77 | ELANE (0.42) | ESR1ESR2KMT2AMEN1ELANE | |
| SCHEMBL26791203 | 0.75 | CA12 (0.36) | KMT2AMEN1ELANEGAAPOLB | |
| SCHEMBL18135082 | 0.73 | ESR1 (0.44) | ESR1ESR2KMT2AMEN1ELANE | |
| SCHEMBL12015393 | 0.73 | CNR2 (0.39) | KMT2AMEN1ALDH1A1SMN1; SMN2POLB | |
| SCHEMBL6400218 | 0.73 | TSHR (0.46) | KMT2AMEN1ALDH1A1SMN1; SMN2POLB | |
| SCHEMBL15447048 | 0.72 | LMNA (0.45) | ELANEGAAALDH1A1SMN1; SMN2CNR1 | |
| SCHEMBL17812507 | 0.72 | TSHR (0.35) | KMT2AMEN1ELANEGAAALDH1A1 | |
| SCHEMBL12014453 | 0.72 | ACE2 (0.37) | KMT2AMEN1CNR1CNR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8778592-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8652756-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-18 | — | — | US | disclosed |
| US-8574816-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20130056653-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-07 | — | — | US | disclosed |
| US-20130056654-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-07 | — | — | US | disclosed |