Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 2/20 | 0.44 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | ATM | Q13315 | 1/20 | 0.41 |
| ▸ | HPGDS | O60760 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | CA12 | O43570 | 1/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
| ▸ | CA7 | P43166 | 1/20 | 0.40 |
| ▸ | CA9 | Q16790 | 1/20 | 0.40 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.40 |
| ▸ | PLK1 | P53350 | 1/20 | 0.39 |
| ▸ | FABP7 | O15540 | 1/20 | 0.39 |
| ▸ | FABP3 | P05413 | 1/20 | 0.39 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.39 |
| ▸ | ELANE | P08246 | 1/20 | 0.38 |
| ▸ | MRGPRX4 | Q96LA9 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18135088 | 0.94 | HPGDS (0.48) | ESR1ESR2MEN1KMT2AATM | |
| SCHEMBL15447048 | 0.87 | LMNA (0.45) | HPGDSL3MBTL1GAAELANECNR2 | |
| SCHEMBL92373 | 0.86 | ESR1 (0.51) | ESR1ESR2MEN1KMT2AGAA | |
| SCHEMBL12021737 | 0.86 | ALDH1A1 (0.41) | ESR1ESR2MEN1KMT2AL3MBTL1 | |
| SCHEMBL18135087 | 0.86 | GLA (0.41) | L3MBTL1GAAELANEMRGPRX4CNR2 | |
| SCHEMBL16672587 | 0.85 | POLB (0.46) | KMT2AATML3MBTL1CA12CA1 | |
| SCHEMBL13706054 | 0.85 | MEN1 (0.37) | ESR1ESR2MEN1KMT2AATM | |
| SCHEMBL7265465 | 0.84 | ALDH1A1 (0.54) | MEN1KMT2AL3MBTL1GAAFABP7 | |
| SCHEMBL12263813 | 0.84 | ESR1 (0.37) | ESR1ESR2MEN1KMT2AL3MBTL1 | |
| SCHEMBL13408039 | 0.84 | ELANE (0.42) | ESR1ESR2MEN1KMT2AL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9904169-B2 | Photomask blank, resist pattern forming process, and method for making photomask | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| US-20160299431-A1 | PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAKING PHOTOMASK | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-10-13 | — | — | US | disclosed |