SCHEMBL12014453

SCHEMBL12014453

CCC1(OC(=O)c2ccc(C(C)C)c3ccccc23)CCCC1

nearest known ligand 0.37

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ACE2 Q9BYF1 2/20 0.37
APOBEC3A P31941 1/20 0.33
APOBEC3G Q9HC16 1/20 0.33
CTSL P07711 3/20 0.32
CTSK P43235 3/20 0.32
LPAR1 Q92633 2/20 0.32
CTSB P07858 2/20 0.32
HPGDS O60760 1/20 0.32
ADRB2 P07550 1/20 0.32
ADRB1 P08588 1/20 0.32
ADRB3 P13945 1/20 0.32
CETP P11597 1/20 0.32
HDAC4 P56524 1/20 0.32
CXCR2 P25025 1/20 0.31
CNR1 P21554 1/20 0.31
CNR2 P34972 1/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
CTSS P25774 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29319010 0.89 TSHR (0.33) ACE2APOBEC3AAPOBEC3GCTSLCTSK
SCHEMBL12015393 0.83 CNR2 (0.39) CTSLCTSKCTSBHDAC4CNR2
SCHEMBL12014448 0.80 CTSL (0.34) CTSLCTSKCTSBHDAC4MEN1
SCHEMBL29319792 0.78 ADORA3 (0.32) CTSLCTSKCTSBCETPHDAC4
SCHEMBL6400218 0.78 TSHR (0.46) CTSLCTSKCTSBCETPHDAC4
SCHEMBL24707014 0.74 TDP1 (0.45) MEN1KMT2A
SCHEMBL27006191 0.74 LMNA (0.49) ADRB2ADRB1ADRB3KMT2A
SCHEMBL12014441 0.74 ADRB2 (0.31) ADRB2ADRB1ADRB3
SCHEMBL6399681 0.73 TDP1 (0.44) CTSLCTSKCTSBMEN1KMT2A
SCHEMBL21891527 0.72 P2RX4 (0.38) APOBEC3AAPOBEC3GCTSLCTSKCTSB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8778592-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-15 US disclosed
US-8652756-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-18 US disclosed
US-8574816-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 US disclosed
US-20130056653-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed
US-20130056654-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed
US-20120220112-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-30 US disclosed