SCHEMBL14768994

SCHEMBL14768994

CCC(C)(C)C(=O)OC(C)(C)C(C)(OC(=O)CC(C)C)C(F)(F)F

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
MLYCD O95822 1/20 0.30
CYP2D6 P10635 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12026754 0.85 MLYCD (0.30) MLYCDCYP2D6
SCHEMBL9924522 0.84 MMP1 (0.34) CYP2D6
SCHEMBL14769025 0.82
SCHEMBL12339709 0.77
SCHEMBL18199019 0.75
SCHEMBL10103515 0.75
SCHEMBL107795 0.75
SCHEMBL10394328 0.74 MMP1 (0.34) MLYCDCYP2D6
SCHEMBL18198982 0.74
SCHEMBL13563633 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130065183-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-14 US disclosed