⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17247956 | 0.85 | MMP8 (0.33) | — | |
| SCHEMBL11991312 | 0.84 | — | — | |
| SCHEMBL14768994 | 0.82 | MLYCD (0.30) | — | |
| SCHEMBL14134533 | 0.81 | — | — | |
| SCHEMBL12339709 | 0.79 | — | — | |
| SCHEMBL10103515 | 0.77 | — | — | |
| SCHEMBL107795 | 0.77 | — | — | |
| SCHEMBL21507871 | 0.77 | — | — | |
| SCHEMBL18198982 | 0.77 | — | — | |
| SCHEMBL13563633 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11703757-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-18 | — | — | US | disclosed |
| US-9519213-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-13 | — | — | US | disclosed |
| US-20160320699-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-03 | — | — | US | disclosed |
| US-20140255843-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-11 | — | — | US | disclosed |
| US-8722307-B2 | Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-13 | — | — | US | disclosed |
| US-20130065183-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-14 | — | — | US | disclosed |