SCHEMBL14769018

SCHEMBL14769018

CCC(C)(C)C(=O)OC1COC2C(OCOC34CC5CC(CC(C5)C3)C4)COC12

nearest known ligand 0.36

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
BCHE P06276 5/20 0.35
KLK7 P49862 1/20 0.31
HMGCR P04035 1/20 0.30
HDAC1 Q13547 1/20 0.30
HDAC2 Q92769 1/20 0.30
HDAC6 Q9UBN7 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14616406 0.81 BCHE (0.36) BCHEKLK7
SCHEMBL14617360 0.80 BCHE (0.41) BCHEKLK7
SCHEMBL15978093 0.77 BCHE (0.39) BCHEKLK7
SCHEMBL13829296 0.77 BCHE (0.39) BCHEKLK7
SCHEMBL14616402 0.77 BCHE (0.36) BCHEKLK7
SCHEMBL14616373 0.76 BCHE (0.38) BCHEKLK7
SCHEMBL14728743 0.76 MEN1 (0.34) BCHEKLK7
SCHEMBL14616378 0.75 BCHE (0.37) BCHEKLK7
SCHEMBL17998610 0.75 BCHE (0.45) BCHEKLK7
SCHEMBL785969 0.75 ALDH1A1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130130177-A1 NEGATIVE PATTERN FORMING PROCESS AND NEGATIVE RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-23 US disclosed
US-20130065183-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-14 US disclosed