SCHEMBL14798409

SCHEMBL14798409

CCO[Si](C)(C)CCCc1ccc(S(=O)(=O)N=[N+]=[N-])cc1

nearest known ligand 0.36

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA2 P00918 6/20 0.35
SMN1; SMN2 Q16637 3/20 0.35
BCL2L1 Q07817 2/20 0.32
BAK1 Q16611 2/20 0.32
CA9 Q16790 1/20 0.32
LMNA P02545 2/20 0.32
HTT P42858 2/20 0.32
TSHR P16473 1/20 0.32
KDM4E B2RXH2 1/20 0.31
CA1 P00915 1/20 0.31
AKT1 P31749 3/20 0.31
IRS1 P35568 1/20 0.30
GAB1 Q13480 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14798576 0.90 CA2 (0.37) CA2SMN1; SMN2BCL2L1BAK1CA9
SCHEMBL17076870 0.89 CA2 (0.36) CA2SMN1; SMN2BCL2L1BAK1CA9
SCHEMBL14798246 0.87 CA2 (0.34) CA2SMN1; SMN2BCL2L1BAK1CA9
SCHEMBL14798414 0.84 CA1 (0.40) CA2SMN1; SMN2CA9HTTTSHR
SCHEMBL10348124 0.83 CA2 (0.33) CA2SMN1; SMN2BCL2L1BAK1CA9
SCHEMBL14798632 0.82 CA2 (0.36) CA2SMN1; SMN2BCL2L1BAK1CA9
SCHEMBL14798250 0.82 CA2 (0.37) CA2SMN1; SMN2BCL2L1BAK1CA9
SCHEMBL14798581 0.81 CA2 (0.38) CA2SMN1; SMN2BCL2L1BAK1CA9
SCHEMBL14798240 0.81 BCL2L1 (0.35) CA2SMN1; SMN2BCL2L1BAK1CA9
SCHEMBL11595972 0.80 CA2 (0.56) CA2SMN1; SMN2CA9LMNAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291908-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-22 US disclosed
US-20150261092-A1 METHOD OF FORMING PATTERN AND LAMINATE KABUSHIKI KAISHA TOSHIBA (JP) 2015-09-17 US disclosed
US-9073284-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2015-07-07 US disclosed
US-20130078570-A1 METHOD OF FORMING PATTERN AND LAMINATE TOSHIBA MEMORY CORPORATION (JP) 2013-03-28 US disclosed