Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6559876 | 0.86 | HSD11B1 (0.33) | ALDH1A1HSD11B1 | |
| SCHEMBL2832307 | 0.81 | ALDH1A1 (0.34) | ALDH1A1SMN1; SMN2HSD11B1NPSR1 | |
| SCHEMBL2220426 | 0.75 | KMT2A (0.32) | ALDH1A1SMN1; SMN2HSD11B1KMT2AEPHX2 | |
| SCHEMBL1071740 | 0.73 | GRIN2D (0.31) | — | |
| SCHEMBL20920211 | 0.72 | ALDH1A1 (0.36) | ALDH1A1KMT2AEPHX2 | |
| SCHEMBL19898983 | 0.72 | HSD11B1 (0.34) | ALDH1A1HSD11B1 | |
| SCHEMBL704030 | 0.71 | ALDH1A1 (0.50) | ALDH1A1SMN1; SMN2HSD11B1KMT2ANPSR1 | |
| SCHEMBL17322714 | 0.71 | ALDH1A1 (0.33) | ALDH1A1SMN1; SMN2HSD11B1KMT2AEPHX2 | |
| SCHEMBL3179851 | 0.70 | KMT2A (0.35) | ALDH1A1SMN1; SMN2HSD11B1KMT2AEPHX2 | |
| SCHEMBL30477996 | 0.69 | HSD11B1 (0.46) | ALDH1A1SMN1; SMN2HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8632948-B2 | Positive-working photoimageable bottom antireflective coating | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2014-01-21 | — | — | US | disclosed |
| EP-2483745-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | AZ Electronic Materials USA Corp. (US) | 2012-08-08 | — | — | EP | disclosed |
| WO-2011039560-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2011-04-07 | — | — | WO | disclosed |
| US-20110076626-A1 | Positive-Working Photoimageable Bottom Antireflective Coating | MERCK PATENT GMBH (DE) | 2011-03-31 | — | — | US | disclosed |
| US-7241552-B2 | Resist composition comprising photosensitive polymer having lactone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-07-10 | — | — | US | disclosed |
| US-7045267-B2 | Resist composition comprising photosensitive polymer having lactone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-05-16 | — | — | US | disclosed |
| US-6861197-B2 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-01 | — | — | US | disclosed |
| US-20050008975-A1 | Chemical resistance; bonding strength; accuracte patterns; photolithography | YOON KWANG-SUB (KR) | 2005-01-13 | — | — | US | disclosed |
| US-20040018442-A1 | Resist composition comprising photosensitive polymer having lactone in its backbone | YOON KWANG-SUB (KR) | 2004-01-29 | — | — | US | disclosed |
| US-6537727-B2 | Improved dry etching resistance, adhesiveness to underlying material layers, line edge roughness of line patterns, contrast characteristics | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-03-25 | — | — | US | disclosed |
| US-20030008231-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-09 | — | — | US | disclosed |
| US-20020042016-A1 | Resist composition comprising photosensitive polymer having loctone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-04-11 | — | — | US | disclosed |