SCHEMBL14825650

SCHEMBL14825650

C=C(C)C(=O)OC(C)(C)C1Cc2cccc(C)c2C1

nearest known ligand 0.34

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 2/20 0.32
MTNR1B P49286 2/20 0.32
NOTUM Q6P988 1/20 0.32
ACHE P22303 1/20 0.31
AADAT Q8N5Z0 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14825711 0.87 DRD2 (0.35) MTNR1AMTNR1BNOTUM
SCHEMBL14825595 0.86 MTNR1A (0.36) MTNR1AMTNR1BNOTUM
SCHEMBL14825708 0.85 NOTUM (0.37) MTNR1AMTNR1BNOTUMAADAT
SCHEMBL15470570 0.79 ALDH1A1 (0.35)
SCHEMBL14825737 0.79 DRD2 (0.44) MTNR1AMTNR1BNOTUMACHE
SCHEMBL14825646 0.78 MAPT (0.34) NOTUMACHEAADAT
SCHEMBL14825612 0.77 MTNR1A (0.44) MTNR1AMTNR1B
SCHEMBL14825701 0.76 MTNR1A (0.43) MTNR1AMTNR1BNOTUM
SCHEMBL14825729 0.76 MTNR1A (0.37) MTNR1AMTNR1BNOTUM
SCHEMBL14825649 0.75 MTNR1A (0.33) MTNR1AMTNR1BACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574817-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 US disclosed
US-8574817-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 US disclosed
US-20130084529-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-04 US disclosed
US-20130084529-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-04 US disclosed