SCHEMBL15470570

SCHEMBL15470570

C=C(C)C(=O)OC(C)(C)C1CC(C)=C(C)C1

nearest known ligand 0.35

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.35
ELANE P08246 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15470553 0.89 ALDH1A1 (0.32) ALDH1A1
SCHEMBL14825595 0.83 MTNR1A (0.36) ALDH1A1ELANE
SCHEMBL15470567 0.82
SCHEMBL674286 0.82 ALDH1A1 (0.39) ALDH1A1
SCHEMBL9610296 0.79 ALDH1A1 (0.37) ALDH1A1
SCHEMBL16807394 0.79 ALDH1A1 (0.37) ALDH1A1
SCHEMBL14825650 0.79 MTNR1A (0.32)
SCHEMBL15470548 0.78 LMNA (0.38) ALDH1A1
SCHEMBL14825646 0.78 MAPT (0.34)
SCHEMBL106840 0.78 ALDH1A1 (0.35) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9075308-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US disclosed
US-9075308-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US disclosed
US-20140045122-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-13 US disclosed
US-20140045122-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-13 US disclosed