Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | BACE1 | P56817 | 1/20 | 0.43 |
| ▸ | NPC1 | O15118 | 2/20 | 0.41 |
| ▸ | RAB9A | P51151 | 2/20 | 0.41 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.41 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.41 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.41 |
| ▸ | KIF11 | P52732 | 2/20 | 0.39 |
| ▸ | ELANE | P08246 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.39 |
| ▸ | CES2 | O00748 | 1/20 | 0.38 |
| ▸ | CES1 | P23141 | 1/20 | 0.38 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.38 |
| ▸ | MAOB | P27338 | 1/20 | 0.38 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.38 |
| ▸ | TRPV6 | Q9H1D0 | 1/20 | 0.38 |
| ▸ | PPARG | P37231 | 1/20 | 0.38 |
| ▸ | PPARA | Q07869 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3180129 | 0.90 | CYP2C19 (0.46) | ALDH1A1ELANECYP2C19HIF1ACES1 | |
| SCHEMBL15648916 | 0.88 | KCNN4 (0.46) | ALDH1A1NPC1RAB9AKIF11ELANE | |
| SCHEMBL14827356 | 0.86 | ELANE (0.40) | ALDH1A1TSHRNPC1RAB9AKIF11 | |
| SCHEMBL27496577 | 0.83 | CYP2C19 (0.43) | ALDH1A1TSHRBACE1ELANECYP2C19 | |
| SCHEMBL14828484 | 0.83 | SRPK1 (0.35) | BACE1RAB9ANR4A1NR4A2NR4A3 | |
| SCHEMBL14828488 | 0.82 | NPC1 (0.37) | ALDH1A1TSHRBACE1NPC1RAB9A | |
| SCHEMBL14827400 | 0.82 | CES2 (0.41) | ALDH1A1BACE1NR4A1NR4A2NR4A3 | |
| SCHEMBL14828493 | 0.81 | CES2 (0.33) | ALDH1A1BACE1NR4A1NR4A2NR4A3 | |
| SCHEMBL14828490 | 0.81 | CES2 (0.33) | ALDH1A1BACE1NPC1RAB9ANR4A1 | |
| SCHEMBL14648216 | 0.80 | ELANE (0.42) | ALDH1A1TSHRBACE1ELANECYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9201300-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-01 | — | — | US | disclosed |
| US-9140988-B2 | Positive resist composition, monomer, polymer, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-22 | — | — | US | disclosed |
| US-9040223-B2 | Resist composition, patterning process and polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-26 | — | — | US | disclosed |
| US-20140178820-A1 | RESIST COMPOSITION, PATTERNING PROCESS AND POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| US-20140178818-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| US-20140162188-A1 | POSITIVE RESIST COMPOSITION, MONOMER, POLYMER, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-12 | — | — | US | disclosed |
| US-20130084527-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |