SCHEMBL14883129

SCHEMBL14883129

Cc1ccc(C(=O)OCCC2CCCCC2)cc1Cl

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.46
KMT2A Q03164 2/20 0.46
MEN1 O00255 1/20 0.46
GAA P10253 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
PTGS2 P35354 1/20 0.44
TDP1 Q9NUW8 2/20 0.43
CHRM2 P08172 2/20 0.43
CHRM4 P08173 2/20 0.43
CHRM5 P08912 2/20 0.43
CHRM1 P11229 2/20 0.43
CHRM3 P20309 2/20 0.43
HTR7 P34969 2/20 0.42
NPC1 O15118 1/20 0.41
TSHR P16473 1/20 0.41
HTT P42858 1/20 0.41
RAB9A P51151 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
EPHX2 P34913 1/20 0.41
ALOX15 P16050 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14883128 0.88 HTR7 (0.47) ALDH1A1KMT2AMEN1PTGS2TDP1
SCHEMBL14883103 0.85 ESR1 (0.43) KMT2APTGS2TDP1CHRM2CHRM4
SCHEMBL14543737 0.82 KMT2A (0.44) ALDH1A1KMT2AL3MBTL1PTGS2TDP1
SCHEMBL250654 0.82 KMT2A (0.47) ALDH1A1KMT2AMEN1TDP1CHRM2
SCHEMBL19354697 0.81 HTR7 (0.52) ALDH1A1KMT2AGAAL3MBTL1TDP1
SCHEMBL14882887 0.81 KMT2A (0.53) ALDH1A1KMT2AMEN1TDP1CHRM2
SCHEMBL14883167 0.81 LMNA (0.52) ALDH1A1KMT2AMEN1L3MBTL1TSHR
SCHEMBL14883132 0.81 MEN1 (0.41) ALDH1A1KMT2AMEN1GAAL3MBTL1
SCHEMBL14883127 0.81 SCN9A (0.41) ALDH1A1KMT2AMEN1GAAL3MBTL1
SCHEMBL3423895 0.80 KMT2A (0.46) ALDH1A1KMT2AMEN1TDP1CHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8927194-B2 Chemical amplified photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-01-06 US disclosed
US-20130177851-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-11 US disclosed
US-20130101940-A1 CHEMICAL AMPLIFIED PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-04-25 US disclosed