SCHEMBL14883103

SCHEMBL14883103

Cc1c(Cl)cc(C(=O)OCCC2CCCCC2)cc1Cl

nearest known ligand 0.43

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.43
PTGS2 P35354 1/20 0.42
SCN9A Q15858 5/20 0.40
CHRM2 P08172 2/20 0.40
CHRM4 P08173 2/20 0.40
CHRM5 P08912 2/20 0.40
CHRM1 P11229 2/20 0.40
CHRM3 P20309 2/20 0.40
KMT2A Q03164 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
HPGD P15428 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.36
TP53 P04637 1/20 0.36
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36
MAPT P10636 1/20 0.36
PKM P14618 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14883130 0.86 ESR1 (0.43) ESR1PTGS2CHRM2CHRM4CHRM5
SCHEMBL14883129 0.85 ALDH1A1 (0.46) PTGS2CHRM2CHRM4CHRM5CHRM1
SCHEMBL107374 0.84 L3MBTL1 (0.43) ESR1PTGS2CHRM2CHRM4CHRM5
SCHEMBL14543740 0.83 SCN9A (0.40) ESR1PTGS2SCN9ACHRM2CHRM4
SCHEMBL14883102 0.81 RAB9A (0.40) PTGS2SCN9ACHRM2CHRM4CHRM5
SCHEMBL12406570 0.80 PTGS2 (0.36) ESR1PTGS2SCN9ACHRM2CHRM4
SCHEMBL16247834 0.80 L3MBTL1 (0.40) PTGS2CHRM2CHRM4CHRM5CHRM1
SCHEMBL10087750 0.79 ESR1 (0.46) ESR1KMT2AHPGDSMN1; SMN2RAB9A
SCHEMBL250654 0.79 KMT2A (0.47) ESR1CHRM2CHRM4CHRM5CHRM1
SCHEMBL14883127 0.78 SCN9A (0.41) PTGS2SCN9ACHRM2CHRM4CHRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8927194-B2 Chemical amplified photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-01-06 US disclosed
US-20130177851-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-11 US disclosed
US-20130101940-A1 CHEMICAL AMPLIFIED PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-04-25 US disclosed