SCHEMBL14904387

SCHEMBL14904387

COC(F)(F)COCC(=O)O

nearest known ligand 0.33

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.33
TSHR P16473 2/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
CTH P32929 1/20 0.32
CBS P35520 1/20 0.32
THPO P40225 1/20 0.32
THRB P10828 1/20 0.31
PTGS1 P23219 1/20 0.31
EGLN1 Q9GZT9 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14904390 0.92 PKM (0.30) PKM
SCHEMBL816275 0.77 ALDH1A1 (0.42) PKMTSHRSMN1; SMN2CTHCBS
SCHEMBL14904396 0.76
SCHEMBL5250076 0.75 TSHR (0.36) TSHRSMN1; SMN2CTHCBSTHPO
SCHEMBL14904398 0.74
SCHEMBL703051 0.72 TSHR (0.38) TSHRSMN1; SMN2CTHCBSTHPO
SCHEMBL724846 0.72 TSHR (0.38) TSHRSMN1; SMN2CTHCBSTHPO
SCHEMBL14904383 0.72
SCHEMBL12194003 0.71 TSHR (0.33) TSHRSMN1; SMN2CTHCBSTHPO
SCHEMBL14963629 0.71 TSHR (0.41) TSHRSMN1; SMN2CTHCBSTHPO

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8822136-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-02 US disclosed
US-20130108960-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-02 US disclosed