⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14904390 | 0.85 | PKM (0.30) | — | |
| SCHEMBL15996501 | 0.79 | — | — | |
| SCHEMBL14904388 | 0.79 | — | — | |
| SCHEMBL14904387 | 0.76 | PKM (0.33) | — | |
| SCHEMBL15996497 | 0.74 | — | — | |
| SCHEMBL15996500 | 0.71 | — | — | |
| SCHEMBL816275 | 0.71 | ALDH1A1 (0.42) | — | |
| SCHEMBL703051 | 0.71 | TSHR (0.38) | — | |
| SCHEMBL724846 | 0.71 | TSHR (0.38) | — | |
| SCHEMBL5250076 | 0.69 | TSHR (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8822136-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-02 | — | — | US | disclosed |
| US-20130108960-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-02 | — | — | US | disclosed |