Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.45 |
| ▸ | RECQL | P46063 | 1/20 | 0.42 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | USP2 | O75604 | 1/20 | 0.40 |
| ▸ | GPR119 | Q8TDV5 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14913696 | 1.00 | HSD17B10 (0.47) | HSD17B10HPGDPOLBL3MBTL1EPHX1 | |
| SCHEMBL3769598 | 0.91 | HPGD (0.54) | HSD17B10HPGDPOLBL3MBTL1EPHX1 | |
| SCHEMBL3769601 | 0.91 | HPGD (0.54) | HSD17B10HPGDPOLBL3MBTL1EPHX1 | |
| SCHEMBL135177 | 0.89 | L3MBTL1 (0.58) | HSD17B10HPGDPOLBL3MBTL1NR1H2 | |
| SCHEMBL47049 | 0.89 | L3MBTL1 (0.58) | HSD17B10HPGDPOLBL3MBTL1NR1H2 | |
| SCHEMBL133363 | 0.89 | L3MBTL1 (0.58) | HSD17B10HPGDPOLBL3MBTL1NR1H2 | |
| Methylene Chloride SCHEMBL28081516 | 0.85 | POLB (0.53) | HSD17B10POLBL3MBTL1NR1H2ALDH1A1 | |
| SCHEMBL282977 | 0.84 | POLB (0.51) | HSD17B10HPGDPOLBL3MBTL1EPHX1 | |
| SCHEMBL282976 | 0.84 | POLB (0.51) | HSD17B10HPGDPOLBL3MBTL1EPHX1 | |
| SCHEMBL192841 | 0.84 | POLB (0.51) | HSD17B10HPGDPOLBL3MBTL1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8999622-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2015-04-07 | — | — | US | disclosed |
| US-20130115556-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-05-09 | — | — | US | disclosed |