SCHEMBL3769601

SCHEMBL3769601

CC(C)(C)OC(=O)N1CCCC1.CC(C)(C)OC(=O)N1CCCC1CO

nearest known ligand 0.54

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.54
POLB P06746 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
HSD17B10 Q99714 1/20 0.47
MEN1 O00255 1/20 0.46
ALDH1A1 P00352 1/20 0.46
MAPT P10636 1/20 0.46
KMT2A Q03164 1/20 0.46
EPHX1 P07099 1/20 0.45
NR1H2 P55055 1/20 0.44
SMN1; SMN2 Q16637 2/20 0.43
PREP P48147 1/20 0.43
USP2 O75604 1/20 0.43
PDE8B O95263 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3769598 1.00 HPGD (0.54) HPGDPOLBL3MBTL1HSD17B10MEN1
SCHEMBL135177 0.93 L3MBTL1 (0.58) HPGDPOLBL3MBTL1HSD17B10MEN1
SCHEMBL133363 0.93 L3MBTL1 (0.58) HPGDPOLBL3MBTL1HSD17B10MEN1
SCHEMBL47049 0.93 L3MBTL1 (0.58) HPGDPOLBL3MBTL1HSD17B10MEN1
SCHEMBL192841 0.91 POLB (0.51) HPGDPOLBL3MBTL1HSD17B10ALDH1A1
SCHEMBL282977 0.91 POLB (0.51) HPGDPOLBL3MBTL1HSD17B10ALDH1A1
SCHEMBL282976 0.91 POLB (0.51) HPGDPOLBL3MBTL1HSD17B10ALDH1A1
SCHEMBL14913696 0.91 HSD17B10 (0.47) HPGDPOLBL3MBTL1HSD17B10MEN1
SCHEMBL14913697 0.91 HSD17B10 (0.47) HPGDPOLBL3MBTL1HSD17B10MEN1
SCHEMBL31048468 0.90 POLB (0.50) HPGDPOLBL3MBTL1HSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10423083-B2 Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrate JSR CORPORATION (JP) 2019-09-24 US disclosed
US-20170176878-A1 CLEANING METHOD OF IMMERSION LIQUID, IMMERSION LIQUID CLEANING COMPOSITION, AND SUBSTRATE JSR CORPORATION (JP) 2017-06-22 US disclosed
US-9259668-B2 Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrate JSR CORPORATION (JP) 2016-02-16 US disclosed
US-9029067-B2 Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same JSR CORPORATION (JP) 2015-05-12 US disclosed
US-20150004547-A1 RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD FOR FORMATION OF RESIST PATTERN BY USING THE SAME JSR CORPORATION (JP) 2015-01-01 US disclosed
US-8877429-B2 Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same JSR CORPORATION (JP) 2014-11-04 US disclosed
US-20130220930-A1 CLEANING METHOD OF IMMERSION LIQUID, IMMERSION LIQUID CLEANING COMPOSITION, AND SUBSTRATE JSR CORPORATION (JP) 2013-08-29 US disclosed
US-20130213894-A1 CLEANING METHOD OF IMMERSION LIQUID, IMMERSION LIQUID CLEANING COMPOSITION, AND SUBSTRATE JSR CORPORATION (JP) 2013-08-22 US disclosed
US-20120244478-A1 RESIST PATTERN FORMATION METHOD JSR CORPORATION (JP) 2012-09-27 US disclosed
US-20100310988-A1 RESIST PATTERN-FORMING METHOD AND RESIST PATTERN MINIATURIZING RESIN COMPOSITION JSR CORPORATION (JP) 2010-12-09 US disclosed
US-20100190104-A1 METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE METHOD JSR CORPORATION (JP) 2010-07-29 US disclosed