SCHEMBL14924831

SCHEMBL14924831

CCC(C)c1ccc(COc2cc(C)cc(C(F)(F)F)c2)cc1

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
FFAR1 O14842 3/20 0.41
PPARG P37231 1/20 0.41
NPC1 O15118 2/20 0.40
RAB9A P51151 2/20 0.40
MAOB P27338 6/20 0.40
HSP90AA1 P07900 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
MME P08473 1/20 0.38
ACE P12821 1/20 0.38
CPA1 P15085 1/20 0.38
ACE2 Q9BYF1 1/20 0.38
AR P10275 1/20 0.38
PSEN1 P49768 1/20 0.38
PSEN2 P49810 1/20 0.38
APH1B Q8WW43 1/20 0.38
NCSTN Q92542 1/20 0.38
APH1A Q96BI3 1/20 0.38
PSENEN Q9NZ42 1/20 0.38
SOD1 P00441 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21958646 0.79 GRM5 (0.51) MAOBARPSEN1PSEN2APH1B
SCHEMBL14924829 0.77 PRSS1 (0.40)
SCHEMBL14461696 0.76 NPC1 (0.55) FFAR1NPC1RAB9AMAOBHSP90AA1
SCHEMBL14866954 0.76 NPC1 (0.55) FFAR1NPC1RAB9AMAOBHSP90AA1
SCHEMBL2759877 0.74 RAPGEF4 (0.36)
SCHEMBL25140232 0.73 MAPT (0.42) FFAR1MAOBL3MBTL1AR
SCHEMBL25836602 0.72 ALDH1A1 (0.35) NPC1RAB9AHSP90AA1L3MBTL1
SCHEMBL14924830 0.72 APP (0.60) FFAR1PPARGNPC1RAB9AHSP90AA1
SCHEMBL14866960 0.72 APP (0.60) FFAR1PPARGNPC1RAB9AHSP90AA1
SCHEMBL13180038 0.72 RXRA (0.48) MAOBL3MBTL1SOD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9034558-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern FUJIFILM CORPORATION (JP) 2015-05-19 US disclosed
US-20130115557-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2013-05-09 US disclosed