SCHEMBL149674

SCHEMBL149674

C=CC(=O)CCOOC(=O)CCC(=O)OOCCC(=O)C=C

nearest known ligand 0.36

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.36
ALDH1A1 P00352 5/20 0.36
TP53 P04637 2/20 0.31
HIF1A Q16665 2/20 0.31
CYP3A4 P08684 1/20 0.31
HSD17B10 Q99714 1/20 0.31
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL149677 0.92 EGLN1 (0.34) TSHRALDH1A1LMNA
SCHEMBL27342790 0.84 TSHR (0.43) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL14732648 0.83 TSHR (0.40) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL27342791 0.79 TSHR (0.40) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL149676 0.77 ADRA2A (0.43) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL30583614 0.74 TSHR (0.48) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL735650 0.72 TSHR (0.34) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL9420567 0.72
SCHEMBL26756764 0.71 LMNA (0.38) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL10633536 0.71 ALDH1A1 (0.33) TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109062007-B Positive photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2023-03-10 CN disclosed
CN-115542666-A Photosensitive resin composition for spacer and protective film 奇美实业股份有限公司 2022-12-30 CN disclosed
CN-108693710-B Positive photosensitive polysiloxane composition 奇美实业股份有限公司 2022-12-02 CN disclosed
CN-114089603-A Flexographic plate support body and preparation method and using method thereof 乐凯华光印刷科技有限公司 2022-02-25 CN disclosed
CN-107179652-B Positive photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2022-02-08 CN disclosed
CN-106200264-B White photosensitive resin composition, white matrix, color filter, reflective display device, white frame and display device 奇美实业股份有限公司 2021-02-26 CN disclosed
CN-111650811-A White photosensitive film and preparation method and application thereof 上海孚赛特新材料股份有限公司 2020-09-11 CN disclosed
CN-106918989-B Photosensitive polysiloxane composition, protective film and module with protective film 奇美实业股份有限公司 2020-07-31 CN disclosed
US-9897729-B2 Photosensitive resin composition for color filter and application thereof CHI MEI CORPORATION (TW) 2018-02-20 US disclosed
US-20180004086-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF SPACER, PRODUCTION METHOD OF PROTECTION FILM, AND LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2018-01-04 US disclosed
US-8654285-B2 Color liquid crystal display device comprising a red filter segment having a red pigment combination wherein the weight ratio of an azo-based red pigment and an anthraquinone-based red pigment ranges from 20/80 to 80/20 CHI MEI CORPORATION (TW) 2014-02-18 US disclosed
US-20130299755-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR A COLOR FILTER AND USES THEREOF CHI MEI CORPORATION (TW) 2013-11-14 US disclosed
US-20130222738-A1 COLOR LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2013-08-29 US disclosed
US-20130208215-A1 COLOR LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2013-08-15 US disclosed
US-8470503-B2 Photosensitive resin composition for color filter and color filter using same CHI MEI CORPORATION (TW) 2013-06-25 US disclosed
US-20130142966-A1 BLUE PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTERS AND USES THEREOF CHI MEI CORPORATION (TW) 2013-06-06 US disclosed
US-20120162575-A1 COLOR LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2012-06-28 US disclosed
US-20120057098-A1 COLOR LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2012-03-08 US disclosed
US-20110228201-A1 Photosensitive resin composition for color filter and color filter using same CHI-MEI CORPORATION 2011-09-22 US disclosed
US-5654348-A FIBER IMPREGNATED WITH ALCOHOL OR GLYCOL ACRYLATE OR METHACRYLATE, GLYCOL DIGLYCIDYL ETHER, TREATED WITH ULTRAVIOLET RADIATION KABUSHIKI KAISHA KOBE SEIKO SHO (JP) 1997-08-05 US disclosed