⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14982575 | 0.80 | — | — | |
| SCHEMBL475144 | 0.80 | TSHR (0.43) | — | |
| SCHEMBL1121870 | 0.80 | TSHR (0.43) | — | |
| SCHEMBL4445937 | 0.79 | LMNA (0.39) | — | |
| SCHEMBL475145 | 0.78 | — | — | |
| SCHEMBL6725242 | 0.78 | CYP2D6 (0.35) | — | |
| SCHEMBL66105 | 0.78 | — | — | |
| SCHEMBL142215 | 0.76 | TSHR (0.39) | — | |
| SCHEMBL8813250 | 0.76 | — | — | |
| SCHEMBL2380925 | 0.76 | ALDH1A1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 167 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114456113-A | Sulfonic acid derivative compounds as photoacid generators in resist applications | 贺利氏电子化工有限责任公司 | 2022-05-10 | — | — | CN | claimed |
| CN-106715398-B | Sulfonic acid derivative compounds as photoacid generators in resist applications | 贺利氏电子化工有限责任公司 | 2021-11-30 | — | — | CN | claimed |
| CN-107810179-B | Sulfonic acid derivative compounds as photoacid generators in resist applications | 贺利氏电子化工有限责任公司 | 2021-10-22 | — | — | CN | claimed |
| US-10976658-B2 | Sulfonic acid derivative compounds as photoacid generators in resist applications | HERAEUS EPURIO LLC (US) | 2021-04-13 | — | — | US | claimed |
| US-20200089110-A1 | SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC | 2020-03-19 | — | — | US | claimed |
| WO-2017034814-A1 | SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | Heraeus Precious Metals North America Daychem LLC (US) | 2017-03-02 | — | — | WO | claimed |
| US-9383644-B2 | Sulfonic acid derivative compounds as photoacid generators in resist applications | Heraeus Precious Metals North America Daychem LLC (US) | 2016-07-05 | — | — | US | claimed |
| WO-2016043558-A1 | PHOTO-ACID GENERATING AGENT | HERAEUS MATERIALS KOREA CORPORATION (KR) | 2016-03-24 | — | — | WO | claimed |
| US-20160085148-A1 | SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC | 2016-03-24 | — | — | US | claimed |
| WO-2016043941-A1 | SULFONIC DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | Heraeus Precious Metals North America Daychem LLC (US) | 2016-03-24 | — | — | WO | claimed |
| EP-1113005-B1 | Sulfonium salt compounds | WAKO PURE CHEM IND LTD (JP) | 2003-08-06 | — | — | EP | claimed |
| US-20030013831-A1 | NOVEL POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2003-01-16 | — | — | US | claimed |
| US-20020187419-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-12 | — | — | US | claimed |
| WO-2002093263-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | claimed |
| WO-2002092651-A1 | POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | claimed |
| EP-1238969-A2 | Sulfonium salt compounds | Wako Pure Chemical Industries, Ltd. (JP) | 2002-09-11 | — | — | EP | claimed |
| EP-1113005-A1 | Sulfonium salt compounds | Wako Pure Chemical Industries, Ltd. (JP) | 2001-07-04 | — | — | EP | claimed |
| US-5770343-A | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-06-23 | — | — | US | claimed |
| EP-0832076-A1 | NOVEL ISOXAZOLINE AND ISOXAZOLE FIBRINOGEN RECEPTOR ANTAGONISTS | THE DU PONT MERCK PHARMACEUTICAL COMPANY (US) | 1998-04-01 | — | — | EP | claimed |
| EP-0749044-A2 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-12-18 | — | — | EP | claimed |