SCHEMBL14983333

SCHEMBL14983333

CCCCOB(OCCCC)c1ccc(C)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PCSK9 Q8NBP7 1/20 0.37
CA2 P00918 2/20 0.37
LPL P06858 1/20 0.37
LIPG Q9Y5X9 1/20 0.37
ORAI1 Q96D31 1/20 0.37
ORAI2 Q96SN7 1/20 0.37
ORAI3 Q9BRQ5 1/20 0.37
TRPV6 Q9H1D0 1/20 0.37
DRD2 P14416 3/20 0.36
DRD4 P21917 3/20 0.36
DRD3 P35462 3/20 0.36
HTT P42858 1/20 0.34
MITF O75030 1/20 0.34
ALDH1A1 P00352 1/20 0.34
LMNA P02545 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
CA1 P00915 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
PTGES O14684 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14983337 0.88 CA2 (0.39) CA2LPLLIPGORAI1ORAI2
SCHEMBL10406540 0.84 ALDH1A1 (0.38) PCSK9CA2LPLLIPGORAI1
SCHEMBL14983368 0.82 TSHR (0.46) CA2DRD3HTTALDH1A1LMNA
SCHEMBL14983499 0.82 CA1 (0.45) PCSK9CA2ALDH1A1SMN1; SMN2CA1
SCHEMBL14983339 0.82 TSHR (0.41) ORAI1ORAI2ORAI3TRPV6DRD2
SCHEMBL3458146 0.82 SMN1; SMN2 (0.38) DRD2DRD4DRD3ALDH1A1LMNA
SCHEMBL1236241 0.82 MGLL (0.37) PCSK9CA2DRD2DRD4DRD3
SCHEMBL3289446 0.82 PCSK9 (0.52) PCSK9DRD2DRD3HTTALDH1A1
SCHEMBL14985968 0.81 NQO1 (0.52) CA2ALDH1A1SMN1; SMN2CA1LTA4H
SCHEMBL5951598 0.80 CNR2 (0.36) PCSK9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2599818-B1 Silicon-containing resist underlayer film-forming composition and patterning process SHINETSU CHEMICAL CO (JP) 2017-02-01 EP disclosed
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
EP-2599818-A1 Silicon-containing resist underlayer film-forming composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2013-06-05 EP disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed