SCHEMBL14999028

SCHEMBL14999028

COc1cccc2c(C(=O)OO)cccc12

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 2/20 0.54
ESR2 Q92731 2/20 0.54
CDC25B P30305 3/20 0.53
PLK1 P53350 1/20 0.51
HPGDS O60760 1/20 0.50
MAPT P10636 3/20 0.46
HPGD P15428 3/20 0.46
KMT2A Q03164 2/20 0.46
ALDH1A1 P00352 2/20 0.46
HSD17B10 Q99714 2/20 0.46
KDM4E B2RXH2 1/20 0.46
CA12 O43570 1/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
CA7 P43166 1/20 0.46
CA9 Q16790 1/20 0.46
CA14 Q9ULX7 1/20 0.46
CYP2C9 P11712 2/20 0.45
CYP1A2 P05177 1/20 0.45
CYP3A4 P08684 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30742694 0.89 PLK1 (0.56) ESR1ESR2CDC25BPLK1HPGDS
SCHEMBL4099121 0.89 PLK1 (0.56) ESR1ESR2CDC25BPLK1HPGDS
SCHEMBL10964177 0.85 CDC25B (0.53) ESR1ESR2CDC25BPLK1HPGDS
SCHEMBL30742731 0.85 CDC25B (0.53) ESR1ESR2CDC25BPLK1HPGDS
SCHEMBL4103770 0.83 CDC25B (0.68) ESR1ESR2CDC25BPLK1HPGDS
SCHEMBL835587 0.83 MAPT (0.58) ESR1ESR2CDC25BPLK1HPGDS
SCHEMBL30742625 0.81 CDC25B (0.53) ESR1ESR2CDC25BPLK1HPGDS
SCHEMBL383183 0.80 HPGD (0.59) ESR1ESR2MAPTHPGDKMT2A
SCHEMBL27426952 0.79 UTS2R (0.47) ESR1ESR2CA12CA1CA2
SCHEMBL4109331 0.79 HPGDS (0.59) ESR1ESR2CDC25BPLK1HPGDS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013081184-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND RESIN FUJIFILM CORPORATION (JP) 2013-06-06 WO disclosed