Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | TSHR | P16473 | 3/20 | 0.40 |
| ▸ | MGAM | O43451 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | SI | P14410 | 1/20 | 0.36 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.36 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5583852 | 0.92 | THRB (0.43) | THRBALDH1A1TSHRMGAMGAA | |
| SCHEMBL11120929 | 0.92 | THRB (0.47) | THRBALDH1A1TSHRMGAMGAA | |
| SCHEMBL2346839 | 0.89 | ALDH1A1 (0.40) | THRBALDH1A1TSHRTGFBR1HSD17B10 | |
| Acrylamide SCHEMBL28264539 | 0.88 | THRB (0.40) | THRBALDH1A1TSHR | |
| SCHEMBL530483 | 0.88 | THRB (0.40) | THRBALDH1A1TSHR | |
| SCHEMBL475299 | 0.85 | THRB (0.42) | THRBALDH1A1TSHRMGAMGAA | |
| SCHEMBL2907949 | 0.85 | THRB (0.38) | THRBALDH1A1TSHR | |
| SCHEMBL28586532 | 0.83 | TGFBR1 (0.38) | THRBALDH1A1TGFBR1 | |
| SCHEMBL9850773 | 0.82 | THRB (0.36) | THRBALDH1A1TSHR | |
| SCHEMBL27019 | 0.82 | TSHR (0.43) | THRBALDH1A1TSHRHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1314 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114868298-B | Composite stripping method | Guangdong Haozhi Technology Co.,Ltd. (CN) | 2026-05-26 | — | — | CN | claimed |
| EP-4169110-B1 | METHOD FOR COMPOSITE DELAMINATION | GRST SINGAPORE PTE LTD (SG) | 2026-04-15 | — | — | EP | claimed |
| EP-4169106-B1 | METHOD FOR COMPOSITE DELAMINATION | GRST SINGAPORE PTE LTD (SG) | 2026-04-01 | — | — | EP | claimed |
| EP-4169108-B1 | METHOD FOR COMPOSITE DELAMINATION | GRST SINGAPORE PTE LTD (SG) | 2025-12-03 | — | — | EP | claimed |
| US-12401040-B2 | Binder composition for secondary battery | GRST SINGAPORE PTE. LTD. (SG) | 2025-08-26 | — | — | US | claimed |
| US-12311648-B2 | Method for composite delamination | GRST SINGAPORE PTE. LTD. (SG) | 2025-05-27 | — | — | US | claimed |
| CN-119916643-A | Photosensitive resin composition, photosensitive dry film, cured film and circuit board | 杭州福斯特电子材料有限公司 | 2025-05-02 | — | — | CN | claimed |
| US-12187021-B2 | Method for composite delamination | GRST INTERNATIONAL LIMITED (CN) | 2025-01-07 | — | — | US | claimed |
| US-20240413337-A1 | Method of Preparing Cathode Slurry for Secondary Battery | GRST SINGAPORE PTE. LTD. (SG) | 2024-12-12 | — | — | US | claimed |
| CN-119108557-A | Method for preparing cathode slurry of secondary battery | 广东省皓智科技有限公司 | 2024-12-10 | — | — | CN | claimed |
| US-5621058-A | STORAGE STABILITY | KANSAI PAINT CO., LTD. (JP) | 1997-04-15 | — | — | US | claimed |
| EP-0709409-A1 | Hydrophilic crosslinked polymer fine particles and process for production thereof | KANSAI PAINT CO., LTD. (JP) | 1996-05-01 | — | — | EP | claimed |
| US-5290634-A | Multilayer elements with supports coated with antistatic layer and gelatin | MITSUBISHI PAPER MILLS LIMITED (JP) | 1994-03-01 | — | — | US | claimed |
| EP-0283990-B1 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO LTD (JP) | 1994-01-26 | — | — | EP | claimed |
| US-5043363-A | Active energy ray-curing resin composition | CANON KABUSHIKI KAISHA (JP) | 1991-08-27 | — | — | US | claimed |
| US-4996132-A | Heat-resistant photosensitive resin composition | TOYKO OHKA KOGYO CO. LTD. (JP) | 1991-02-26 | — | — | US | claimed |
| US-4774349-A | Method of preparing N-methylphosphonic acid diesters of acrylic and methacrylic acid amines from methylol | ROHM GMBH CHEMISCHE FABRIK (DE) | 1988-09-27 | — | — | US | claimed |
| EP-0280295-A2 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1988-08-31 | — | — | EP | claimed |
| US-4335829-A | CURING A MIXTURE CONTAINING AN ACRYLIC POLYMER MADE FROM N-ETHOXYMETHYLACRYLAMIDE OR N-ETHOXYMETHYLMETHACRYLAMIDE AND AN ACRYLIC ACID | PPG INDUSTRIES, INC. (US) | 1982-06-22 | — | — | US | claimed |
| US-4289674-A | COATINGS FOR INTERIORS OF BEER CANS | PPG INDUSTRIES, INC. (US) | 1981-09-15 | — | — | US | claimed |