SCHEMBL15020505

SCHEMBL15020505

O=C(O)Oc1ccc2ccccc2c1CCN1CCOCC1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 4/20 0.50
▸ CNR1 P21554 3/20 0.50
▸ KDM4E B2RXH2 3/20 0.50
▸ KMT2A Q03164 3/20 0.50
▸ CNR2 P34972 2/20 0.50
▸ TSHR P16473 3/20 0.49
▸ NPSR1 Q6W5P4 1/20 0.49
▸ USP2 O75604 1/20 0.47
▸ POLB P06746 1/20 0.47
▸ ALDH1A1 P00352 5/20 0.46
▸ SMN1; SMN2 Q16637 2/20 0.46
▸ L3MBTL1 Q9Y468 1/20 0.46
▸ NCEH1 Q6PIU2 1/20 0.44
▸ LMNA P02545 1/20 0.44
▸ GAA P10253 1/20 0.44
▸ TDP1 Q9NUW8 1/20 0.44
▸ NPC1 O15118 1/20 0.44
▸ HPGD P15428 1/20 0.44
▸ RAB9A P51151 1/20 0.44
▸ ALB P02768 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29227358 0.80 TSHR (0.53) MAPTCNR1KDM4EKMT2ACNR2
SCHEMBL29227136 0.78 KDM4E (0.74) MAPTCNR1KDM4EKMT2ACNR2
SCHEMBL9086867 0.77 POLB (0.51) MAPTKDM4EKMT2AUSP2POLB
SCHEMBL29227100 0.75 PRMT5 (0.52) MAPTCNR1KDM4EKMT2ACNR2
SCHEMBL29227088 0.75 LMNA (0.55) MAPTCNR1KDM4EKMT2ACNR2
SCHEMBL29227130 0.72 TSHR (0.48) MAPTCNR1KDM4EKMT2ACNR2
SCHEMBL29227106 0.72 TSHR (0.48) MAPTCNR1KDM4EKMT2ACNR2
SCHEMBL3796068 0.72 CYP2C19 (0.56) MAPTCNR1KDM4EKMT2ACNR2
SCHEMBL5795349 0.71 KDM4E (0.52) MAPTCNR1KDM4EKMT2ACNR2
SCHEMBL31618176 0.70 KMT2A (0.59) MAPTKMT2ATSHRPOLBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9057949-B2 Patterning process, resist composition, polymer, and polymerizable ester compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-16 — — US disclosed
US-20130157194-A1 PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-06-20 — — US disclosed
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