⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1892678 | 0.97 | — | — | |
| SCHEMBL715712 | 0.94 | — | — | |
| Acetic Acid SCHEMBL27398767 | 0.86 | FFAR3 (0.37) | — | |
| SCHEMBL27363206 | 0.75 | — | — | |
| SCHEMBL10040252 | 0.73 | CA2 (0.50) | — | |
| Ammonia Solution, Strong SCHEMBL716352 | 0.71 | — | — | |
| SCHEMBL1892675 | 0.69 | — | — | |
| SCHEMBL595425 | 0.69 | CA5A (0.36) | — | |
| Methoxymethane SCHEMBL27799236 | 0.69 | — | — | |
| SCHEMBL14513786 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7906038-B2 | Aqueous polishing liquid and chemical mechanical polishing method | FUJIFILM CORPORATION (JP) | 2011-03-15 | — | — | US | disclosed |
| US-20070069176-A1 | Aqueous polishing liquid and chemical mechanical polishing method | FUJI PHOTO FILM CO., LTD. | 2007-03-29 | — | — | US | disclosed |