Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 1/20 | 0.34 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.34 |
| ▸ | NAAA | Q02083 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19135755 | 0.80 | CES2 (0.33) | — | |
| SCHEMBL13637810 | 0.79 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL4620336 | 0.79 | NAAA (0.33) | CYP4F2CYP4A11NAAAALDH1A1CA1 | |
| SCHEMBL2418446 | 0.77 | NAAA (0.52) | NAAAALDH1A1CA1CA2EPHX1 | |
| SCHEMBL805653 | 0.77 | NAAA (0.52) | NAAAALDH1A1CA1CA2EPHX1 | |
| SCHEMBL25667382 | 0.76 | CA1 (0.33) | CYP4F2CYP4A11NAAAALDH1A1CA1 | |
| SCHEMBL8954907 | 0.76 | NAAA (0.55) | NAAAALDH1A1EPHX1 | |
| SCHEMBL16174327 | 0.76 | ACHE (0.44) | CYP4F2CYP4A11NAAAALDH1A1 | |
| SCHEMBL1626354 | 0.76 | NAAA (0.55) | NAAAALDH1A1EPHX1 | |
| SCHEMBL14341535 | 0.76 | NAAA (0.55) | NAAAALDH1A1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9057949-B2 | Patterning process, resist composition, polymer, and polymerizable ester compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-9057949-B2 | Patterning process, resist composition, polymer, and polymerizable ester compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-20130157194-A1 | PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| US-20130157194-A1 | PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |