SCHEMBL15043152

SCHEMBL15043152

CCC(C)C(=O)OC1COC2C(OCOCC(C)(C)C)COC12

nearest known ligand 0.39

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
KLK7 P49862 7/20 0.38
KLK5 Q9Y337 4/20 0.38
BCHE P06276 10/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15978093 0.80 BCHE (0.39) KLK7KLK5BCHE
SCHEMBL13829296 0.80 BCHE (0.39) KLK7KLK5BCHE
SCHEMBL14616430 0.78 ALDH1A1 (0.36) KLK7KLK5BCHE
SCHEMBL14617345 0.78 ALDH1A1 (0.36) KLK7KLK5BCHE
SCHEMBL17998625 0.77 BCHE (0.45) KLK7KLK5BCHE
SCHEMBL17518574 0.77 BCHE (0.40) KLK7KLK5BCHE
SCHEMBL14368599 0.76 BCHE (0.44) BCHE
SCHEMBL14616290 0.74 THRB (0.41) BCHE
SCHEMBL14617337 0.74 ALDH1A1 (0.37) KLK7KLK5BCHE
SCHEMBL14617355 0.74 ALDH1A1 (0.37) KLK7KLK5BCHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9057949-B2 Patterning process, resist composition, polymer, and polymerizable ester compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-16 US disclosed
US-20130157194-A1 PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-06-20 US disclosed