SCHEMBL15043191

SCHEMBL15043191

CCCC1(COC(C)OCC)CC2C=CC1C2

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15045977 0.83 CYP2D6 (0.30) CYP2D6CYP2C19
SCHEMBL5355482 0.78 LMNA (0.36) LMNACYP2D6CYP2C19
SCHEMBL5356027 0.71 CYP2D6 (0.36) LMNACYP2D6CYP2C19
SCHEMBL5354152 0.70 CYP2D6 (0.33) CYP2D6CYP2C19
SCHEMBL15043113 0.69 LMNA (0.33) LMNA
SCHEMBL11736719 0.69 CYP2D6 (0.41) CYP2D6CYP2C19
SCHEMBL5356755 0.69 CYP2D6 (0.32) CYP2D6CYP2C19
SCHEMBL7067453 0.67 CYP2D6 (0.39) CYP2D6CYP2C19
SCHEMBL11737086 0.66 CYP2D6 (0.39) CYP2D6CYP2C19
SCHEMBL3364369 0.66 CYP2D6 (0.35) CYP2D6CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9057949-B2 Patterning process, resist composition, polymer, and polymerizable ester compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-16 US disclosed
US-20130157194-A1 PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-06-20 US disclosed