SCHEMBL15045977

SCHEMBL15045977

CCOC(C)OCC1(CCC(=O)OC)CC2C=CC1C2

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.30
CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15043191 0.83 LMNA (0.33) CYP2D6CYP2C19
SCHEMBL7649293 0.83 LMNA (0.38) CYP2D6CYP2C19
SCHEMBL15043230 0.79 CYP2D6 (0.30) CYP2D6CYP2C19
SCHEMBL5355482 0.71 LMNA (0.36) CYP2D6CYP2C19
SCHEMBL5837786 0.70 ADAM17 (0.33) CYP2D6CYP2C19
SCHEMBL5837412 0.69 TSHR (0.33) CYP2D6CYP2C19
SCHEMBL5838282 0.69 TSHR (0.33) CYP2D6CYP2C19
SCHEMBL14531157 0.68 CYP2D6 (0.35) CYP2D6CYP2C19
SCHEMBL3364369 0.67 CYP2D6 (0.35) CYP2D6CYP2C19
SCHEMBL983564 0.67 CYP2D6 (0.42) CYP2D6CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9057949-B2 Patterning process, resist composition, polymer, and polymerizable ester compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-16 US disclosed
US-20130157194-A1 PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-06-20 US disclosed